17 results
Retaining Ring Design Impact on CMP Process Stability and Optimization
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- Journal:
- MRS Online Proceedings Library Archive / Volume 1249 / 2010
- Published online by Cambridge University Press:
- 01 February 2011, 1249-E02-01
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- 2010
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Pad Topography, Contact Area and Hydrodynamic Lubrication in Chemical-Mechanical Polishing
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- Journal:
- MRS Online Proceedings Library Archive / Volume 1157 / 2009
- Published online by Cambridge University Press:
- 31 January 2011, 1157-E01-02
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- 2009
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Novel End-point Detection Method by Monitoring Shear Force Oscillation Frequency for Barrier Metal Polishing in Advanced LSI
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- Journal:
- MRS Online Proceedings Library Archive / Volume 1157 / 2009
- Published online by Cambridge University Press:
- 31 January 2011, 1157-E13-03
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- 2009
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Optimizing Pad Groove Design and Polishing Kinematics for Reduced Shear Force, Low Force Fluctuation and Optimum Removal Rate Attributes of Copper CMP
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- Journal:
- MRS Online Proceedings Library Archive / Volume 1157 / 2009
- Published online by Cambridge University Press:
- 31 January 2011, 1157-E01-01
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- 2009
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Experimental Investigation and Numerical Simulation of Pad Stain Formation during Copper CMP
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- Journal:
- MRS Online Proceedings Library Archive / Volume 991 / 2007
- Published online by Cambridge University Press:
- 01 February 2011, 0991-C06-02
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- 2007
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Screening Study on Frictional Force Analysis in Relation to Silica Abrasive and Slurry Properties
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- Journal:
- MRS Online Proceedings Library Archive / Volume 991 / 2007
- Published online by Cambridge University Press:
- 01 February 2011, 0991-C08-03
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- 2007
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CMP Active Diamond Characterization and Conditioner Wear
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- Journal:
- MRS Online Proceedings Library Archive / Volume 991 / 2007
- Published online by Cambridge University Press:
- 01 February 2011, 0991-C01-01
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- 2007
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Investigation of Diamond Grit Size and Conditioning Force Effect on CMP Pads Topography
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- Journal:
- MRS Online Proceedings Library Archive / Volume 991 / 2007
- Published online by Cambridge University Press:
- 01 February 2011, 0991-C01-07
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- 2007
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Quantitative In-Situ Measurement of Asperity Compression Under the Wafer During Polishing
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- Journal:
- MRS Online Proceedings Library Archive / Volume 867 / 2005
- Published online by Cambridge University Press:
- 01 February 2011, W5.4
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- 2005
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Instantaneous Fluid Film Imaging in Chemical Mechanical Planarization
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- Journal:
- MRS Online Proceedings Library Archive / Volume 867 / 2005
- Published online by Cambridge University Press:
- 01 February 2011, W2.3
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- 2005
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In Situ Temperature Measurement During Oxide Chemical Mechanical Planarization
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- Journal:
- MRS Online Proceedings Library Archive / Volume 767 / 2003
- Published online by Cambridge University Press:
- 01 February 2011, F1.6
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- 2003
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Effect of Tool Kinematics, Brush Pressure and Cleaning Fluid pH on Coefficient of Friction and Tribology of post-CMP PVA Brush Scrubbing Processes
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- Journal:
- MRS Online Proceedings Library Archive / Volume 767 / 2003
- Published online by Cambridge University Press:
- 01 February 2011, F5.8
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- 2003
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Dispersion Number Studies in ChemicalMechanical Planarization
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- Journal:
- MRS Online Proceedings Library Archive / Volume 767 / 2003
- Published online by Cambridge University Press:
- 01 February 2011, F5.2
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- 2003
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Effect of Pad Surface Texture and Slurry Abrasive Concentration on Tribological and Kinetic Attributes of ILD CMP
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- Journal:
- MRS Online Proceedings Library Archive / Volume 767 / 2003
- Published online by Cambridge University Press:
- 01 February 2011, F2.8
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- 2003
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Spectral Analysis of Frictional Forces in ILD CMP
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- Journal:
- MRS Online Proceedings Library Archive / Volume 767 / 2003
- Published online by Cambridge University Press:
- 01 February 2011, F1.11
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- 2003
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Slurry Utilization Efficiency Studies in Chemical Mechanical Planarization
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- Journal:
- MRS Online Proceedings Library Archive / Volume 767 / 2003
- Published online by Cambridge University Press:
- 01 February 2011, F1.4
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- 2003
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The Effect of Wafer Shape on Slurry Film Thickness and Friction Coefficients in Chemical Mechanical Planarization
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- Journal:
- MRS Online Proceedings Library Archive / Volume 613 / 2000
- Published online by Cambridge University Press:
- 14 March 2011, E1.2.1
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- 2000
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