6 results
Atomic Layer Deposition of Aluminum Nitride Thin films from Trimethyl Aluminum (TMA) and Ammonia
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- Journal:
- MRS Online Proceedings Library Archive / Volume 811 / 2004
- Published online by Cambridge University Press:
- 28 July 2011, D1.9
- Print publication:
- 2004
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Atomic Layer Deposition of Hafnium Oxide Thin Films from Tetrakis(dimethylamino)Hafnium (TDMAH) and Ozone
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- Journal:
- MRS Online Proceedings Library Archive / Volume 765 / 2003
- Published online by Cambridge University Press:
- 01 February 2011, D3.8
- Print publication:
- 2003
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Engineered Low Resistivity Titanium-Tantalum Nitride Films by Atomic Layer Deposition
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- Journal:
- MRS Online Proceedings Library Archive / Volume 714 / 2001
- Published online by Cambridge University Press:
- 17 March 2011, L5.3.1
- Print publication:
- 2001
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Engineered tantalum aluminate and hafnium aluminate ALD films for ultrathin dielectric films with improved electrical and thermal properties
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- Journal:
- MRS Online Proceedings Library Archive / Volume 670 / 2001
- Published online by Cambridge University Press:
- 21 March 2011, K2.2
- Print publication:
- 2001
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On Advanced Interconnect Using Low Dielectric Constant Materials as Inter-Level Dielectrics
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- Journal:
- MRS Online Proceedings Library Archive / Volume 427 / 1996
- Published online by Cambridge University Press:
- 15 February 2011, 415
- Print publication:
- 1996
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Methods And Needs For Low K Material Research
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- Journal:
- MRS Online Proceedings Library Archive / Volume 381 / 1995
- Published online by Cambridge University Press:
- 15 February 2011, 3
- Print publication:
- 1995
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