4 results
Si Surface Orientation Dependence on the Electrical Characteristics of HfN Gate Insulator with sub-0.5 nm EOT Formed by ECR Plasma Sputtering
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- Journal:
- MRS Online Proceedings Library Archive / Volume 1588 / 2014
- Published online by Cambridge University Press:
- 20 February 2014, jsapmrs13-1588-6607
- Print publication:
- 2014
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Croconic Acid Thin Film Formation for Ferroelectric Gate OFETs
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- Journal:
- MRS Online Proceedings Library Archive / Volume 1587 / 2014
- Published online by Cambridge University Press:
- 16 December 2013, jsapmrs13-1587-7087
- Print publication:
- 2014
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- Article
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A Study on Selective Etching of SiGe Layers in SiGe/Si Systems for Device Applications
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- Journal:
- MRS Online Proceedings Library Archive / Volume 795 / 2003
- Published online by Cambridge University Press:
- 01 February 2011, U11.8
- Print publication:
- 2003
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- Article
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AlON thin films formed by ECR plasma oxidation for high-k gate insulator application
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- Journal:
- MRS Online Proceedings Library Archive / Volume 786 / 2003
- Published online by Cambridge University Press:
- 01 February 2011, E6.10
- Print publication:
- 2003
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