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In situ laser recrystallization of Si layers during low-pressure chemical vapor deposition: Recrystallization dynamics and influence of the seed layer
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- Journal:
- Journal of Materials Research / Volume 17 / Issue 11 / November 2002
- Published online by Cambridge University Press:
- 31 January 2011, pp. 2966-2973
- Print publication:
- November 2002
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- Article
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