7 results
Doping of Sub-50nm SOI Layers
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- Journal:
- MRS Online Proceedings Library Archive / Volume 1070 / 2008
- Published online by Cambridge University Press:
- 01 February 2011, 1070-E04-06
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- 2008
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Source-drain Engineering for Channel-limited PMOS Device Performance: Advances in Understanding of Amorphization-Based Implant Techniques
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- Journal:
- MRS Online Proceedings Library Archive / Volume 1070 / 2008
- Published online by Cambridge University Press:
- 01 February 2011, 1070-E04-01
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- 2008
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Enhanced Antimony Activation for Ultra-Shallow Junctions in Strained Silicon
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- Journal:
- MRS Online Proceedings Library Archive / Volume 912 / 2006
- Published online by Cambridge University Press:
- 01 February 2011, 0912-C02-03
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- 2006
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The Carbon Co-implant with Spike RTA Solution for Phosphorus Extension
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- Journal:
- MRS Online Proceedings Library Archive / Volume 912 / 2006
- Published online by Cambridge University Press:
- 01 February 2011, 0912-C01-06
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- 2006
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The Carbon Co-implant with Spike RTA Solution for Boron Extension
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- Journal:
- MRS Online Proceedings Library Archive / Volume 912 / 2006
- Published online by Cambridge University Press:
- 01 February 2011, 0912-C01-03
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- 2006
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Shallow Junctions for Sub-100 Nm Cmos Technology
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- Journal:
- MRS Online Proceedings Library Archive / Volume 669 / 2001
- Published online by Cambridge University Press:
- 21 March 2011, J3.5
- Print publication:
- 2001
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Furnace and Rta Injection of Point Defects into CVD-Grown B Doped Si and SiGe
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- Journal:
- MRS Online Proceedings Library Archive / Volume 610 / 2000
- Published online by Cambridge University Press:
- 17 March 2011, B4.9
- Print publication:
- 2000
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