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Constraints on removal of Si3N4 film with conformation-controlled poly(acrylic acid) in shallow-trench isolation chemical–mechanical planarization (STI CMP)
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- Journal:
- Journal of Materials Research / Volume 23 / Issue 1 / January 2008
- Published online by Cambridge University Press:
- 31 January 2011, pp. 49-54
- Print publication:
- January 2008
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- Article
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