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Measurement and Modeling of Atomic Chlorine Concentrations in Plasma Processes
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- Journal:
- MRS Online Proceedings Library Archive / Volume 117 / 1988
- Published online by Cambridge University Press:
- 22 February 2011, 35
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- 1988
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Concentration Measurements of Chlorine Atoms in A Plasma Reactor
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- Journal:
- MRS Online Proceedings Library Archive / Volume 68 / 1986
- Published online by Cambridge University Press:
- 28 February 2011, 115
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- 1986
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Monte Carlo Modeling of Ion Transport Througe RF Glow Discharge Sheaths
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- Journal:
- MRS Online Proceedings Library Archive / Volume 68 / 1986
- Published online by Cambridge University Press:
- 28 February 2011, 231
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- 1986
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Directional Plasma Etching of Polysilicon in SF6/CFCL3 discharges
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- Journal:
- MRS Online Proceedings Library Archive / Volume 68 / 1986
- Published online by Cambridge University Press:
- 28 February 2011, 281
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- 1986
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Kinetic Analysis of Chlorofluorocarbon Discharges
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- Journal:
- MRS Online Proceedings Library Archive / Volume 38 / 1984
- Published online by Cambridge University Press:
- 21 February 2011, 235
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- 1984
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Parametric Characterization of Plasma Etching Processes
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- Journal:
- MRS Online Proceedings Library Archive / Volume 38 / 1984
- Published online by Cambridge University Press:
- 21 February 2011, 227
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- 1984
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