7 results
Comparative determination of the electron temperature in Ar- and N2-plasmas with electrostatic probes, optical emission spectroscopy OES and energy dispersive mass spectrometry EDMS
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- Journal:
- The European Physical Journal - Applied Physics / Volume 15 / Issue 1 / July 2001
- Published online by Cambridge University Press:
- 15 July 2001, pp. 49-56
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- July 2001
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The Origin of the Enhanced Optical Absorption in Hot Wire Microcrystalline Silicon
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- Journal:
- MRS Online Proceedings Library Archive / Volume 507 / 1998
- Published online by Cambridge University Press:
- 10 February 2011, 819
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- 1998
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An Absorption Study of Microcrystalline Silicon Deposited by Hot-Wire CVD
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- Journal:
- MRS Online Proceedings Library Archive / Volume 467 / 1997
- Published online by Cambridge University Press:
- 15 February 2011, 451
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- 1997
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Investigation of the Amorphous to Nanocrystalline Phase Transition at the Deposition of Silicon Films in an ECWR Plasma of Pure SiH4
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- Journal:
- MRS Online Proceedings Library Archive / Volume 420 / 1996
- Published online by Cambridge University Press:
- 10 February 2011, 437
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- 1996
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In Situ Ellipsometric Study of the Dependence of a-Si:H Film Growth on Substrate Properties and Ignition Procedures
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- Journal:
- MRS Online Proceedings Library Archive / Volume 336 / 1994
- Published online by Cambridge University Press:
- 16 February 2011, 85
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- 1994
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A Quantitative Model for the Metastable Defect Creation in Amorphous Semiconductors by Kev-Electron Irradiation
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- Journal:
- MRS Online Proceedings Library Archive / Volume 336 / 1994
- Published online by Cambridge University Press:
- 16 February 2011, 293
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- 1994
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Correlation Between Structural and Photo Electrical Properties of a-Si1−xGex:H Alloy Films - New Interpretation Concerning the Preferential Attachment of Hydrogen
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- Journal:
- MRS Online Proceedings Library Archive / Volume 219 / 1991
- Published online by Cambridge University Press:
- 21 February 2011, 277
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- 1991
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