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Low pressure chemical vapor deposition of silicon nitride using the environmentally friendly tris(dimethylamino)silane precursor
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- Journal:
- Journal of Materials Research / Volume 11 / Issue 6 / June 1996
- Published online by Cambridge University Press:
- 31 January 2011, pp. 1483-1488
- Print publication:
- June 1996
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- Article
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