5 results
Simulation of mesa structures for III-V semiconductors under ion beam etching
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- Journal:
- The European Physical Journal - Applied Physics / Volume 6 / Issue 3 / June 1999
- Published online by Cambridge University Press:
- 15 June 1999, pp. 273-280
- Print publication:
- June 1999
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Simulation Study of IBE Process for III-V Compounds in Mesa and Trenches
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- Journal:
- MRS Online Proceedings Library Archive / Volume 490 / 1997
- Published online by Cambridge University Press:
- 10 February 2011, 225
- Print publication:
- 1997
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Surface Reactivity of Silicon and Germanium in CF4 -O2 Reactive Ion Etching
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- Journal:
- MRS Online Proceedings Library Archive / Volume 324 / 1993
- Published online by Cambridge University Press:
- 22 February 2011, 311
- Print publication:
- 1993
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Energy Distribution of Ions in Plasma Etching Reactors
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- Journal:
- MRS Online Proceedings Library Archive / Volume 68 / 1986
- Published online by Cambridge University Press:
- 28 February 2011, 109
- Print publication:
- 1986
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Etching and Surface Modification of Polyimide in O2 -SF6 Plasmas
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- Journal:
- MRS Online Proceedings Library Archive / Volume 68 / 1986
- Published online by Cambridge University Press:
- 28 February 2011, 401
- Print publication:
- 1986
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