Diamond deposition on group VIII transition metals of Cr, Mn, Fe, Co, and Ni has been achieved by a multi-step chemical vapor deposition process consisting of (i) seeding the substrate with diamond powders, (ii) annealing the seeded substrate in hydrogen at high temperatures, and (iii) diamond nucleation and growth. It was found that high quality diamond can be grown on these substrates, and the often accompanied graphite formation, which has been the main obstacle in the deposition of diamond on these metal surfaces, can be largely suppressed by the above step-deposition procedure. This technique was further extended to the processes of depositing diamond on steels and Co-bonded WC materials.