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Identification and Quantification of Boron Dopant Sites in Antiferromagnetic Cr2O3 Films by Electron Energy Loss Spectroscopy

Published online by Cambridge University Press:  04 August 2017

Congli Sun
Affiliation:
Department of Materials Science and Engineering, University of Wisconsin-Madison, Madison, WI, USA
Michael Street
Affiliation:
Department of Physics and Astronomy, Nebraska Center for Materials and Nanoscience, University of Nebraska, Lincoln, Nebraska, USA
Ryan Jacobs
Affiliation:
Department of Materials Science and Engineering, University of Wisconsin-Madison, Madison, WI, USA
Dane Morgan
Affiliation:
Department of Materials Science and Engineering, University of Wisconsin-Madison, Madison, WI, USA
Paul M. Voyles
Affiliation:
Department of Materials Science and Engineering, University of Wisconsin-Madison, Madison, WI, USA
Christian Binek
Affiliation:
Department of Physics and Astronomy, Nebraska Center for Materials and Nanoscience, University of Nebraska, Lincoln, Nebraska, USA
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© Microscopy Society of America 2017 

References

[1] He, X., et al, Nat. Mater. 9 2010). p. 579.CrossRefGoogle Scholar
[2] Mu, S., Wysocki, A.L. & Belashchenko, K.D. Phys. Rev. B 87 2013). p. 1.CrossRefGoogle Scholar
[3] Sauer, H., et al, Ultramicroscopy. 49 1993). p. 198.CrossRefGoogle Scholar
[4] Souche, C., et al, Micron. 29 1998). p. 419.CrossRefGoogle Scholar
[5] This work was supported in part by C-SPIN, one of the six centers of STARnet, a Semiconductor Research Corporation program, sponsored by MARCO and DARPA.Google Scholar
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Identification and Quantification of Boron Dopant Sites in Antiferromagnetic Cr2O3 Films by Electron Energy Loss Spectroscopy
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Identification and Quantification of Boron Dopant Sites in Antiferromagnetic Cr2O3 Films by Electron Energy Loss Spectroscopy
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