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Preparation and characterization of Nd3+ and Er3+-doped silica sol-gel coatings by Rutherford backscattering spectroscopy and spectroscopic ellipsometry

Published online by Cambridge University Press:  31 January 2011

S. Bruynooghe
Affiliation:
LETI-CEA (Technologies Avancées)–Département Optronique–17 avenue des Martyrs, 38054 Grenoble Cedex 09, France
A. Chabli
Affiliation:
LETI-CEA (Technologies Avancées)–Département Optronique–17 avenue des Martyrs, 38054 Grenoble Cedex 09, France
F. Bertin
Affiliation:
LETI-CEA (Technologies Avancées)–Département Optronique–17 avenue des Martyrs, 38054 Grenoble Cedex 09, France
F. Pierre
Affiliation:
LETI-CEA (Technologies Avancées)–Département Optronique–17 avenue des Martyrs, 38054 Grenoble Cedex 09, France
G. Leflem
Affiliation:
ICMCB/CNRS–Avenue du Docteur A. Schweitzer, 33600 Pessac, France
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Abstract

Neodymium- or erbium-doped silica films are deposited on single crystal silicon substrates using a sol-gel process and a spin-coating technique. These glasses are doped with neodymium or erbium in various Nd/Si or Er/Si atomic ratios up to 8% using neodymium nitrate or erbium nitrate as precursor. A preparation method of such films is described. Film rare earth concentration measured by Rutherford Backscattering Spectroscopy (RBS) is the same as in the initial liquid solution. Film thickness and refractive index are obtained by variable angle spectroscopic ellipsometry. We have shown that both RBS analysis and spectroscopic ellipsometry are powerful tools to control rare earth doping level and optical properties of the silica films.

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Articles
Copyright
Copyright © Materials Research Society 1997

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References

REFERENCES

1.Zelmon, D. E., Jackson, H. E., Boyd, J. T., Naumaan, A., and Anderson, D. B., Appl. Phys. Lett. 42, 565 (1983).CrossRefGoogle Scholar
2.Pliskin, W. A., in Physical Measurement and Analysis of Thin Films, edited by Murt, E. and Guldner, G. W. (Plenum, New York, 1969), p. 168.CrossRefGoogle Scholar
3.Olsen, J. E. and Shimura, F., J. Appl. Phys. 66, 1353 (1989).CrossRefGoogle Scholar
4.Pliskin, W. A. and Castrucci, P. P., Electrochem. Technol. 6, 85 (1968).Google Scholar
5.Kawachi, M., Yasu, M., and Edahiro, T., Electron. Lett. 19, 583 (1983).CrossRefGoogle Scholar
6.Dislich, H., J. Non-Cryst. Solids 57, 371 (1983).CrossRefGoogle Scholar
7.Schroeder, H., in Physics of Thin Films, edited by Haas, G. and Thun, R. E. (Academic Press, New York, 1969), Vol. 5, p. 87.Google Scholar
8.Grenbenshikov, I. V., Vlosov, A. G., Neporent, B. S., and Sujkovskaya, N. V., Antireflective Optical Coatings (Gostechizdat, Moscow, 1949).Google Scholar
9.Sujkovskaya, N. V., Chemical Methods for Thin Transparent Film Preparation (Chimija, Leningrad, 1971).Google Scholar
10.Brinker, C. F. and Scherer, G. W., Sol-Gel Science (Academic Press, San Diego, CA, 1990), pp. 787, 788.Google Scholar
11.Sakka, S., in Treatise on Materials Science and Technology, edited by Tomozawa, M. and Doremus, R. (Academic Press, New York, 1982), Vol. 22, p. 129.CrossRefGoogle Scholar
12.Heuberger, K. and Lukosz, W., Appl. Opt. 25, 1499 (1986).CrossRefGoogle Scholar
13.Hewak, D. W. and Lit, J. W. Y., Appl. Opt. 27, 4562 (1988).CrossRefGoogle Scholar
14.Pope, E. J. and Mackenzie, J. D., J. Non-Cryst. Solids 106, 236 (1988).CrossRefGoogle Scholar
15.Moutonnet, D., Chaplain, R., Gauneau, M., Pelous, Y., and Rehspringer, J. L., Mater. Sci. Eng. B 9, 455 (1991).CrossRefGoogle Scholar
16.Sosman, R. B., The Phases of Silica (Rutgers Univ. Press, New Brunswick, NJ, 1965).Google Scholar
17.de Nijs, J. M. M. and Van Silfhout, A., J. Opt. Soc. Am. 5 (6), 773 (1988).CrossRefGoogle Scholar
18.Palik, E. D., Handbook of Optical Constants of Solids (Academic Press, New York, 1985), pp. 547, 569.Google Scholar
19.Malitson, I. H., J. Opt. Soc. Am. 55 (10), 1205 (1965).CrossRefGoogle Scholar
20.Press, W. H., Flannery, B. P., Teukolsky, S. A., and Vetterling, W. T., Numerical Recipes (Cambridge Univ. Press, Cambridge, England, 1988).Google Scholar
21.Humlicek, J., J. Opt. Soc. Am. 2 (5), 713 (1985).CrossRefGoogle Scholar
22.Pliskin, W. A., J. Vac. Sci. Technol. 14 (5), 1064 (1977).CrossRefGoogle Scholar