Hostname: page-component-76fb5796d-vvkck Total loading time: 0 Render date: 2024-04-27T01:37:43.540Z Has data issue: false hasContentIssue false
  • English
  • Français

Numerical analysis for co-condensation processes in silicide nanoparticle synthesis using induction thermal plasmas at atmospheric pressure conditions

Published online by Cambridge University Press:  03 March 2011

Masaya Shigeta  and
Takayuki Watanabe
Masaya Shigeta*
Affiliation:
Department of Environmental Chemistry and Engineering, Tokyo Institute of Technology, Midori-ku, Yokohama, 226-8503, Japan
Takayuki Watanabe
Affiliation:
Department of Environmental Chemistry and Engineering, Tokyo Institute of Technology, Midori-ku, Yokohama, 226-8503, Japan
*
a)Address all correspondence to this author. e-mail: shigeta@nr.titech.ac.jp
Get access

Abstract

Numerical analysis is conducted to clarify the formation mechanisms of silicide nanoparticles synthesized in an induction thermal plasma maintained at atmospheric pressure. The induction thermal plasma is analyzed by an electromagnetic fluid dynamics approach, in addition to a multi-component co-condensation model, proposed for the silicide nanoparticle synthesis. In the Cr–Si and Co–Si systems, silicon vapor is consumed by homogeneous nucleation and heterogeneous condensation processes; subsequently, metal vapor condenses heterogeneously onto liquid silicon particles. The Mo–Si system shows the opposite tendency. In the Ti–Si system, vapors of silicon and titanium condense simultaneously on the silicon nuclei. Each system produces nanoparticle diameters of around 10 nm, and the required disilicides, with the stoichiometric composition, are obtained. Only the Ti–Si system has a narrow range of silicon content. The numerical analysis results agree with the experimental findings. Finally, the correlation chart, predicting the saturation vapor pressure ratios and the resulting silicon contents, is presented for estimation of nanoparticle compositions produced in the co-condensation processes.

Keywords

Intermetallic alloysNanoparticlesNucleation & growth
Type
Articles
Information
Journal of Materials Research , Volume 20 , Issue 10 , October 2005 , pp. 2801 - 2811
Copyright
Copyright © Materials Research Society 2005

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1Sakano, M., Watanabe, T. and Tanaka, M.: Numerical and experimental comparison of induction thermal plasma characteristics between 0.5 MHz and 4 MHz. J. Chem. Eng. Jpn. 32, 619 (1999).CrossRefGoogle Scholar
2Sakano, M., Tanaka, M. and Watanabe, T.: Application of radio-frequency thermal plasmas to recover materials from fly ash. Thin Solid Films 386, 189 (2001).CrossRefGoogle Scholar
3Shigeta, M., Sato, T. and Nishiyama, H.: Numerical simulation of a potassium-seeded turbulent RF inductively coupled plasma with particles. Thin Solid Films 435, 5 (2003).CrossRefGoogle Scholar
4Shigeta, M., Sato, T. and Nishiyama, H.: Computational experiment of a particle-laden RF inductively coupled plasma with seeded potassium vapor. Int. J. Heat Mass Transfer 47, 707 (2004).CrossRefGoogle Scholar
5Engineers, Japan Society of Mechanical: Functional Fluids and Intelligent Fluids (Corona Pub. Corp., Japan, 2000), p. 2.Google Scholar
6Nishiyama, H. and Shigeta, M.: Numerical simulation of an RF inductively coupled plasma for functional enhancement by seeding vaporized alkali metal. European Phys. J., Appl. Phys. 18(2), 125 (2002).CrossRefGoogle Scholar
7Girshick, S.L., Chiu, C-P., Muno, R., Wu, C.Y., Yang, L., Singh, S.K. and McMurry, P.H.: Thermal plasma synthesis of ultrafine iron particles. J. Aerosol Sci. 24(3), 367 (1993).CrossRefGoogle Scholar
8Watanabe, T. and Fujiwara, K.: Control of diameter and yield of silicon dioxide ultrafine particles prepared by radio frequency thermal plasmas. J. Soc. of Inorg. Mater. Jpn. 7, 285 (2000).Google Scholar
9Shigeta, M., Watanabe, T. and Nishiyama, H.: Numerical investigation for nanoparticle synthesis in an RF inductively coupled plasma. Thin Solid Films 457, 192 (2004).CrossRefGoogle Scholar
10Watanabe, T., Nezu, A., Abe, Y., Ishii, Y. and Adachi, K.: Formation mechanism of electrically conductive nanoparticles by induction thermal plasmas. Thin Solid Film 435, 27 (2003).CrossRefGoogle Scholar
11Watanabe, T. and Okumiya, H.: Formation mechanism of silicide nanoparticles by induction thermal plasmas. Sci. and Technol. Advanced Mater. 5, 639 (2004).CrossRefGoogle Scholar
12Mostaghimi, J., Proulx, P. and Boulos, M.I.: An analysis of the computer modeling of the flow and temperature fields in an inductively coupled plasma. Numerical Heat Trans. 8, 187 (1985).Google Scholar
13Bilodeau, J-F. and Proulx, P.: A mathematical model for ultrafine iron powder growth in thermal plasma. Aerosol Sci. Tech. 24, 175 (1996).CrossRefGoogle Scholar
14Desilets, M., Bilodeau, J-F. and Proulx, P.: Modelling of the reactive synthesis of ultra-fine powders in a thermal plasma reactor. J. Phys. D: Appl. Phys. 30, 1951 (1997).CrossRefGoogle Scholar
15Paul, K.C., Takashima, T. and Sakuta, T.: Copper vapor effect on RF inductively coupled SF6 plasmas. IEEE Trans. Plasma Sci. 26, 1000 (1998).CrossRefGoogle Scholar
16Wang, C., Imahori, T., Tanaka, Y., Sakuta, T., Takikawa, H. and Matsuo, H.: Silicon inclusion effect on fullerene formation under induction thermal plasma condition. Thin Solid Films 407, 72 (2002).CrossRefGoogle Scholar
17Chen, X. and Pfender, L.: Modeling of RF plasma torches with a metallic tube inserted for reactant injection. Plasma Chem. Plasma Proc. 11, 103 (1991).CrossRefGoogle Scholar
18Hirschfelder, J.O., Curtiss, C.F. and Bird, R.B.: Molecular Theory of Gases and Liquids (John Wiley, New York, 1964), p. 484.Google Scholar
19Miller, R.C. and Ayen, R.I.: Temperature profiles and energy balance for an inductively coupled plasma torch. J. Applied Phys. 10, 5260 (1969).CrossRefGoogle Scholar
20Hoffert, M.I. and Lien, H.: Quasi-one-dimensional, nonequilibrium gas dynamics of partially ionized two-temperature argon. Phys. Fluids 10, 1769 (1967).CrossRefGoogle Scholar
21Patankar, S.V.: Numerical Fluid Dow and Heat Transfer (Hemisphere, New York, 1980), p. 138.Google Scholar
22Friedlander, S.K.: Smoke, Dust and Haze, Fundamentals of Aerosol Dynamics 2nd ed. (Oxford Univ. Press, Oxford, U.K., 2000) p. 275.Google Scholar
23Girshick, S.I., Chiu, C.P. and McMurry, P.H.: Time-dependent aerosol models and homogeneous nucleation rates. Aerosol Sci. Technol. 13, 465 (1990).CrossRefGoogle Scholar
24Joshi, S.V., Liang, Q., Park, J.Y. and Batdorf, J.A.: Effect of quenching conditions on particle formation and growth in thermal plasma synthesis of fine powders. Plasma Chem. Plasma Proc. 10, 339 (1990).CrossRefGoogle Scholar
25Metals, Japan Institute of: Metal Data Book (Maruzen, Japan, 1993), p. 16.Google Scholar
26Phanse, G.M. and Pratsinis, S.E.: Theory for aerosol generation in laminar flow condensers, Aerosol Sci. Technol. 11, 100 (1989).CrossRefGoogle Scholar
27Massalski, T.B.: Binary Alloy Phase Diagrams, 2nd ed. 3 (American Society for Metals, Materials Park, 1990), p. 2664.Google Scholar