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Erratum: “Silicon oxidation and Si–SiO2 interface of thin oxides” [J. Mater. Res. 2, 216(1987)]

Published online by Cambridge University Press:  31 January 2011

N. M. Ravindra ,
J. Narayan ,
Dariush Fathy ,
J. K. Srivastava  and
E. A. Irene
N. M. Ravindra
Affiliation:
Materials Science and Engineering Department, North Carolina State University, Raleigh, North Carolina 27695-7907
J. Narayan
Affiliation:
Materials Science and Engineering Department, North Carolina State University, Raleigh, North Carolina 27695-7907
Dariush Fathy
Affiliation:
Solid State Division. Oak Ridge National Laboratory, Oak Ridge, Tennessee, 37831
J. K. Srivastava
Affiliation:
Department of Chemistry, University of North Carolina, Chapel Hill, North Carolina 27514
E. A. Irene
Affiliation:
Department of Chemistry, University of North Carolina, Chapel Hill, North Carolina 27514

Abstract

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Type
Erratum
Information
Journal of Materials Research , Volume 2 , Issue 3 , June 1987 , pp. 415
Copyright
Copyright © Materials Research Society 1987