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Electrochemical behavior of bimetallic Ni–Ti surface generated by ion implantation

Published online by Cambridge University Press:  03 March 2011

M.T. Pham
Affiliation:
Forschungszentrum Rossendorf e.V., Institute of Ion Beam Physics and Materials Research, P.O. Box 51 01 19, 01314 Dresden, Germany
M.F. Maitz
Affiliation:
Forschungszentrum Rossendorf e.V., Institute of Ion Beam Physics and Materials Research, P.O. Box 51 01 19, 01314 Dresden, Germany
H. Reuther
Affiliation:
Forschungszentrum Rossendorf e.V., Institute of Ion Beam Physics and Materials Research, P.O. Box 51 01 19, 01314 Dresden, Germany
E. Richter
Affiliation:
Forschungszentrum Rossendorf e.V., Institute of Ion Beam Physics and Materials Research, P.O. Box 51 01 19, 01314 Dresden, Germany
W. Matz
Affiliation:
Forschungszentrum Rossendorf e.V., Institute of Ion Beam Physics and Materials Research, P.O. Box 51 01 19, 01314 Dresden, Germany
A. Muecklich
Affiliation:
Forschungszentrum Rossendorf e.V., Institute of Ion Beam Physics and Materials Research, P.O. Box 51 01 19, 01314 Dresden, Germany
F. Prokert
Affiliation:
Forschungszentrum Rossendorf e.V., Institute of Ion Beam Physics and Materials Research, P.O. Box 51 01 19, 01314 Dresden, Germany
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Abstract

Thin films Ni−Ti (<100 nm) having surface Ni content below 5 at.% were prepared by ion-implanting Ni into Ti surfaces. The Ni-containing phase exposed or buried within the Ti matrix was amorphous. Following an anodic oxidation in NaOH, the material was shown to be redox active and to promote the electrocatalytic oxidation of glucose depending on the surface Ni–Ti composition. Compared to the Ni–Ti bulk alloy (55.9:44.08), the Ni-implanted Ti displayed a more efficient catalytic activity and improved corrosion resistance.

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Articles
Copyright
Copyright © Materials Research Society 2004

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