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Amorphous to anatase transformation in atomic layer deposited titania thin films induced by hydrothermal treatment at 120 °C

Published online by Cambridge University Press:  31 January 2011

Zhaoming Zhang ,
Gerry Triani  and
Liang-Jen Fan
Zhaoming Zhang*
Affiliation:
Institute of Materials Engineering, Australian Nuclear Science and Technology Organisation, Lucas Heights, New South Wales 2234, Australia
Gerry Triani
Affiliation:
Institute of Materials Engineering, Australian Nuclear Science and Technology Organisation, Lucas Heights, New South Wales 2234, Australia
Liang-Jen Fan
Affiliation:
National Synchrotron Radiation Research Center, Hsinchu 30076, Taiwan
*
a)Address all correspondence to this author:email: zhaoming.zhang@ansto.gov.au
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Abstract

Hydrothermal treatment has been applied successfully to convert amorphous titania films to crystalline anatase at 120 °C, a temperature compatible with most polymeric substrates. The amorphous films were deposited at 80 °C using atomic layer deposition (ALD). The crystallinity of the films was monitored by x-ray absorption near edge structure (XANES), and the film composition was determined by x-ray photoelectron spectroscopy (XPS). The effect of precursor chemistry and substrate material was investigated. It was found that titania films produced from Ti isopropoxide are easier to crystallize than those from Ti tetrachloride as the Ti precursor. The amorphous to crystalline transformation can be achieved more readily with films deposited on Si than polycarbonate substrates. The effect of a “seed” layer on the amorphous to crystalline transformation was also studied. Preformed anatase crystallites between the Si substrate and the amorphous film were shown to accelerate the crystallization process. The possible mechanisms responsible for the phase transformation are discussed.

Keywords

Atomic layer depositionPhase transformationThin film
Type
Articles
Information
Journal of Materials Research , Volume 23 , Issue 9 , September 2008 , pp. 2472 - 2479
Copyright
Copyright © Materials Research Society 2008

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