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Observation of a rapid amorphization reaction

Published online by Cambridge University Press:  31 January 2011

T.C. Hufnagel ,
S. Brennan ,
A.P. Payne  and
B.M. Clemens
T.C. Hufnagel
Affiliation:
Department of Materials Science and Engineering, Stanford University, Stanford, California 94305–2205
S. Brennan
Affiliation:
Stanford Synchrotron Radiation Laboratory, Stanford, California 94309
A.P. Payne
Affiliation:
Department of Materials Science and Engineering, Stanford University, Stanford, California 94305–2205
B.M. Clemens
Affiliation:
Department of Materials Science and Engineering, Stanford University, Stanford, California 94305–2205
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Abstract

We have observed a rapid amorphization reaction at ambient temperature in the Gd/Co system by employing grazing incidence x-ray scattering. We find that a 135 Å crystalline Gd film is amorphized in less than 30 min by deposition of Co. We postulate that the rapidity of the reaction is due to surface diffusion of Co atoms after deposition to fast diffusion sites such as grain boundaries in the Gd film. Once the interfacial region has been amorphized these fast diffusion paths are sealed off from the surface, rapid diffusion of Co into the Gd crystalline layer is prevented, and the amorphization reaction stops.

Type
Rapid Communications
Information
Journal of Materials Research , Volume 7 , Issue 8 , August 1992 , pp. 1976 - 1979
Copyright
Copyright © Materials Research Society 1992

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