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The influence of mixed phases on optical properties of HfO2 thin films prepared by thermal oxidation

Published online by Cambridge University Press:  14 January 2011

Yizhu Xie
Affiliation:
Key Laboratory for Magnetism and Magnetic Materials of the Ministry of Education, Lanzhou University, Lanzhou 730000, Gansu, People’s Republic of China
Ziwei Ma
Affiliation:
Key Laboratory for Magnetism and Magnetic Materials of the Ministry of Education, Lanzhou University, Lanzhou 730000, Gansu, People’s Republic of China
Yuroug Su
Affiliation:
Key Laboratory for Magnetism and Magnetic Materials of the Ministry of Education, Lanzhou University, Lanzhou 730000, Gansu, People’s Republic of China
Yanxia Liu
Affiliation:
Key Laboratory for Magnetism and Magnetic Materials of the Ministry of Education, Lanzhou University, Lanzhou 730000, Gansu, People’s Republic of China
Lixin Liu
Affiliation:
Key Laboratory for Magnetism and Magnetic Materials of the Ministry of Education, Lanzhou University, Lanzhou 730000, Gansu, People’s Republic of China
Haiting Zhao
Affiliation:
Key Laboratory for Magnetism and Magnetic Materials of the Ministry of Education, Lanzhou University, Lanzhou 730000, Gansu, People’s Republic of China
Jinyuan Zhou
Affiliation:
Key Laboratory for Magnetism and Magnetic Materials of the Ministry of Education, Lanzhou University, Lanzhou 730000, Gansu, People’s Republic of China
Zhenxing Zhang
Affiliation:
Key Laboratory for Magnetism and Magnetic Materials of the Ministry of Education, Lanzhou University, Lanzhou 730000, Gansu, People’s Republic of China
Jian Li
Affiliation:
Key Laboratory for Magnetism and Magnetic Materials of the Ministry of Education, Lanzhou University, Lanzhou 730000, Gansu, People’s Republic of China
Erqing Xie*
Affiliation:
Key Laboratory for Magnetism and Magnetic Materials of the Ministry of Education, Lanzhou University, Lanzhou 730000, Gansu, People’s Republic of China
*
a)Address all correspondence to this author. e-mail: xieeq@lzu.edu.cn
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Abstract

Hafnium dioxide (HfO2) thin films were synthesized on silicon and quartz substrates by thermal oxidation of metallic hafnium films in oxygen. The crystalline structure and optical properties of the HfO2 films were systematically investigated using x-ray diffraction, ultraviolet (UV)-Raman, and UV-visible spectrophotometer techniques. All the films thermally oxidized at 450 to 800 °C were mostly monoclinic. Interestingly, cubic phase coexisted with monoclinic phase in the films thermally oxidized at 500 to 600 °C. The corresponding optical band gap (Eg) varied from 5.92 to 6.08 eV for the films with a different phase ratio (cubic to monoclinic one) ranging between 0 and 1:3. These results imply that the mixed phase could have a certain effect on the increase of the Eg of HfO2 films.

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Articles
Copyright
Copyright © Materials Research Society 2011

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