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Soft-Mode Phonons in SrTiO3 Thin Films Studied by Far-Infrared Ellipsometry and Raman Scattering

Published online by Cambridge University Press:  10 February 2011

A. A. Sirenko
Affiliation:
Department of Physics, the Pennsylvania State University, University Park, PA 16802, sirenko@phs.psu edu
C. Bernhard
Affiliation:
Max-Planck-Institut für Festkörperforschung, D-70569 Stuttgart, Germany
A. Golnik
Affiliation:
Max-Planck-Institut für Festkörperforschung, D-70569 Stuttgart, Germany
I. A. Akimov
Affiliation:
Department of Physics, the Pennsylvania State University, University Park, PA 16802, sirenko@phs.psu edu
A. M. Clark
Affiliation:
Department of Physics, the Pennsylvania State University, University Park, PA 16802, sirenko@phs.psu edu
J.-H. Hao
Affiliation:
Department of Physics, the Pennsylvania State University, University Park, PA 16802, sirenko@phs.psu edu
X. X. Xi
Affiliation:
Department of Physics, the Pennsylvania State University, University Park, PA 16802, sirenko@phs.psu edu
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Abstract

We report the experimental studies of the vibrational spectra of SrTiO3 films with the thickness of 1 µm grown by pulsed laser deposition. Fourier-transform infrared ellipsometry between 30 and 700 cm−1 and electric field-induced Raman scattering have been utilized for investigation of the phonon behavior. These results can be used for comparison with the low-frequency measurements of the static dielectric constant. In the films, the soft mode reveals hardening compared to that in bulk crystals. This observation is in agreement with the Lyddane-Sachs-Teller formalism.

Type
Research Article
Copyright
Copyright © Materials Research Society 2000

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References

1. Auciello, O., Scott, J. F., and Ramesh, R., Physics Today 51, 22 (1998).10.1063/1.882324Google Scholar
2. Li, H.-Ch., Si, W., West, A. D., and Xi, X. X., Appl. Phys. Lett. 73,190 (1998).10.1063/1.121751Google Scholar
3. Li, H.-Ch., Si, W., West, A. D., and Xi, X. X., Appl. Phys. Lett. 73,464 (1998).10.1063/1.121901Google Scholar
4. Fuchs, D., Schneider, C. W., Schneider, R., and Rietschel, H., J. Appl. Phys., 85, 7362 (1999).10.1063/1.369363Google Scholar
5. McKee, R. A., Walker, F. J., and Chisholm, M. F., Phys. Rev. Lett., 81, 3014 (1998).10.1103/PhysRevLett.81.3014Google Scholar
6. Zhou, C. and Newns, D. M., J. Appl. Phys. 82, 3081 (1997).10.1063/1.366147Google Scholar
7. Basceri, C., Streiffer, S. K., Kingon, A. I., and Waser, R., J. Appi. Phys. 82, 2497 (1997).10.1063/1.366062Google Scholar
8. Akimov, I. A., Sirenko, A. A., Clark, A. M., Hao, J.-H., and Xi, X. X., unpublished.Google Scholar
9. Fröhlich, H., Theory of Dielectrics (Oxford: Clarendon Press, 1949).Google Scholar
10. Cochran, W., Adv. Phys. 9, 387 (1960).10.1080/00018736000101229Google Scholar
11. Cowley, R. A., Adv. Phys. 12, 421 (1963).10.1080/00018736300101333Google Scholar
12. Servoin, J. L., Luspin, Y., and Gervais, F., Phys. Rev. B 22, 5501 (1980).10.1103/PhysRevB.22.5501Google Scholar
13. Chaves, A. S., Barreto, F.C.S., and Ribeiro, L.A.A., Phys. Rev. Lett. 37, 618 (1976).10.1103/PhysRevLett.37.618Google Scholar
14. Axe, J. D., Harada, J., and Shirane, G., Phys. Rev. B 1, 1227 (1970).10.1103/PhysRevB.1.1227Google Scholar
15. Worlock, J. M. and Fleury, P. A., Phys. Rev. Lett. 19, 1176 (1967).10.1103/PhysRevLett.19.1176Google Scholar
16. Vogt, H., Phys. Rev. B 51, 8046 (1995).10.1103/PhysRevB.51.8046Google Scholar
17. Lindner, P. and Wignall, G., MRS Bulletin 24 (No. 12), 34 (1999).10.1557/S0883769400053707Google Scholar
18. Sirenko, A. A., Bernhard, C., Golnik, A., Clark, A. M., Hao, J.-H., Si, W., and Xi, X. X., accepted for publication in Nature (2000).Google Scholar
19. Sirenko, A. A., Akimov, I.A., Fox, J.R., Clark, A.M., Li, H.-Ch., Si, W., and Xi, X.X., Phys. Rev. Lett. 82, 4500 (1999).10.1103/PhysRevLett.82.4500Google Scholar
20. Wells, B. O. et al. , unpublished.Google Scholar
21. Henn, R., Bernhard, C., Wittlin, A., Cardona, M., and Uchida, S., Thin Solid Films 314–315, 643, (1998).Google Scholar
22. Berreman, D. W., Phys. Rev. 130, 2193 (1963).10.1103/PhysRev.130.2193Google Scholar