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Giant Magnetoresistance in Iron and Cobalt Implanted Silver Thin Films

Published online by Cambridge University Press:  10 February 2011

C. M. De Jesus
Affiliation:
CFN, Universidade de Lisboa, Av. Prof Gama Pinto, 2, P-1699 Lisboa Codex, Portugal
J. G. Marques
Affiliation:
CFN, Universidade de Lisboa, Av. Prof Gama Pinto, 2, P-1699 Lisboa Codex, Portugal
J. C. Soares
Affiliation:
CFN, Universidade de Lisboa, Av. Prof Gama Pinto, 2, P-1699 Lisboa Codex, Portugal
L. M. Redondo
Affiliation:
Instituto Tecnológico e Nuclear, Estrada Nacional 10, P-2685 Sacavém, Portugal
M. F. Da Silva
Affiliation:
Instituto Tecnológico e Nuclear, Estrada Nacional 10, P-2685 Sacavém, Portugal
M. M. Pereira De Azevedo
Affiliation:
IFIMUP, Universidade do Porto, P-4150 Porto, Portugal
J. B. Sousa
Affiliation:
IFIMUP, Universidade do Porto, P-4150 Porto, Portugal
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Abstract

The magnetoresistive behavior of granular thin films prepared by Fe and Co implantation in Ag thin films is reported. Ag thin films (∼2000Å) were implanted with Fe or Co at fluences up to 8×1016 at./cm2. The magnetoresistive response obtained after implantation was found to increase with the implanted fluence. A further increase by a factor of 3–4 can be achieved annealing the films in a conventional furnace at 620 K under vacuum. The best value of the magnetoresistance obtained so far is 9% at 10 K for a film implanted with Co at a fluence of 8×1016 at./cm2.

Type
Research Article
Copyright
Copyright © Materials Research Society 1998

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References

REFERENCES

1. Baibich, M.N., Broto, J.M., Fert, A., Nguyen Van Dau, F., Petroff, F., Etienne, P., Creuzet, G., Friedrich, A., and Chazelas, J., Phys. Rev. Lett. 61, 2472 (1988).Google Scholar
2. Berkowitz, A.E., Mitchell, J.R., Carey, M.J., Young, A.P., Zhang, S., Spada, F.E., Parker, F.T., Hutten, A., and Thomas, G., Phys. Rev. Lett. 68, 3745 (1992).Google Scholar
3. Xiao, J.X., Jiang, J.S., Chien, C.L., Phys. Rev. Lett. 68, 3749 (1992).Google Scholar
4. Rogalski, M.S., Pereira de Azevedo, M.M., and Sousa, J.B., J. Magn. Magn. Mater. 163, L256 (1996).Google Scholar
5. Dieny, B., Teixeira, S.R., Rodmacq, B., Cowache, C., Aufret, S., Redon, O., and Pierre, J., J. Magn. Magn. Mater. 130, 197 (1994).Google Scholar
6. Pereira de Azevedo, M.M., Mendes, J.A., Rogalski, M.S., Sousa, J.B., Redondo, L.M., de Jesus, C.M., Marques, J.G., Silva, M.F. da, and Soares, J.C., J. Magn. Magn. Mater. 173, 230 (1997).Google Scholar
7. Ziegler, J.F., Biersack, J.P., and Littmark, U., The Stopping and Range of Ions in Solids, (Pergamon Press, New York, 1985).Google Scholar