Hostname: page-component-848d4c4894-pftt2 Total loading time: 0 Render date: 2024-05-07T04:07:21.526Z Has data issue: false hasContentIssue false
  • English
  • Français

Laser Annealing of Semiconductor Clusters: Trimethylamine Reactions with Positive and Negative Clusters

Published online by Cambridge University Press:  28 February 2011

S. Maruyama ,
L. R. Anderson  and
R. E. Smalley
S. Maruyama
Affiliation:
RQI Visiting Fellow, Department of Mechanical Engineering, University of Tokyo, Bunkyo-ku, Tokyo 113, Japan.
L. R. Anderson
Affiliation:
Rice Quantum Institute and Departments of Chemistry and Physics Rice University, Houston, Texas 77251
R. E. Smalley
Affiliation:
Rice Quantum Institute and Departments of Chemistry and Physics Rice University, Houston, Texas 77251
Get access

Abstract

Reaction studies with trimethylamine on positively charged laser-annealed silicon clusters of 39, 43, and 48 atoms magnetically levitated in a Fourier transform ion cyclotron resonance (FT-ICR) mass spectrometer reveal the same relative reaction pattern as previously observed for identical studies with ammonia and ethylene. The 39th cluster was found to be considerably less reactive than the other positive cluster sizes, and significantly, its negative ion is also relatively less reactive than the 43rd and 48th. The continued observation of this reactivity trend provides additional experimental evidence that the annealed clusters adopt well-organized structures, and that these crystal forms are similar for both charge states.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 206: Symposium G – Clusters and Cluster-Assembled Materials , 1990 , 63
Copyright
Copyright © Materials Research Society 1991

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

REFERENCES

1. Rohlfing, E. A., Cox, D. M., and Kaldor, A., J. Chem. Phys. 81, 3322 (1984).CrossRefGoogle Scholar
2. Kroto, H. W., Heath, J. R., O’Brien, S. C., Curl, R. F., and Smalley, R. E., Nature 318, 162 (1985).Google Scholar
3. Heath, J. R., O’Brien, S. C., Zhang, Q., Liu, Y., Curl, R. F., Kroto, H. W., and Smalley, R. E., J. Am. Chem. Soc. 107, 7779 (1985).Google Scholar
4. Zhang, Q. L.,. O’Brien, S. C., Heath, J. R., Liu, Y., Curl, R. F., Kroto, H. W., and Smalley, R. E., J. Phys. Chem. 90, 525 (1986).CrossRefGoogle Scholar
5. Curl, R. F. and Smalley, R. E., Science 242, 1017 (1988).CrossRefGoogle Scholar
6. Taylor, R., Hare, J. P., Abdul-Sada, A. K., and Kroto, H. W., Chem. Comm. in press.Google Scholar
7. Meijer, G., and Bethune, D. S., J. Am. Chem. Soc, in press.Google Scholar
8. Allem, P. M., Koch, A., Wudl, F., Rubin, Y., Diederich, F., Alvarez, M. M., Anz, S. J., Whetten, R. L., J. Phys. Chem. in press (1990).Google Scholar
9. Haufler, R. E.,. Conceicao, J., Chibante, L. P. F., Chai, Y., Byrne, N. E., Flanagan, S., Haley, M. M., O–Brien, S. C., Pan, C., Xiao, Z., Billups, W. E., Ciufolini, M. A., Hauge, R. H., Margrave, J. L., Wilson, L. J., Curl, R. F., and Smalley, R. E., J. Phys. Chem. 94, 8634 (1990).Google Scholar
10. Elkind, J. L., Alford, J. M., Weiss, F. D., Laaksonen, R. T., and Smalley, R. E., J. Chem. Phys. 87, 2397 (1987).CrossRefGoogle Scholar
11. Alford, J. M. and Smalley, R. E., Mat. Res. Soc. Symp. Proc. 131, 3 (1989).Google Scholar
12. Alford, J. M., Laaksonen, R. T., and Smalley, R. E., J. Chem. Phys. in press.Google Scholar
13. Anderson, L. R., Maruyama, S., and Smalley, R. E., Chem. Phys. Lett, in press.Google Scholar
14. Maruyama, S., Anderson, L. R., and Smalley, R. E., J. Chem. Phys. 93, 5349 (1990).Google Scholar
15. Maruyama, S., Anderson, L. R., and Smalley, R. E., Rev. Sci. Instrum. in press.Google Scholar
16. Bloomfield, L. A., Freeman, R. R., and Brown, W. L., Phys. Rev. Lett. 54, 2246 (1985).Google Scholar
17. Zheng, L.-S., Brucat, P. J., Pettiette, C. L., Yang, S., and Smalley, R. E., J. Chem. Phys. 83, 4273 (1985).Google Scholar
18. Phillips, J. C., J. Chem. Phys. 88, 2090 (1988).Google Scholar
19. Jelski, D. A., Wu, Z. C., and George, T. F., Chem. Phys. Lett. 150, 447 (1988).Google Scholar
20. Kaxiras, E., Chem. Phys. Lett. 163, 323 (1989).Google Scholar
21. Kaxiras, E., Phys. Rev. Lett. 64, 551 (1990).CrossRefGoogle Scholar
22. Patterson, C. H. and Messmer, R. P., Phys. Rev. B in press.Google Scholar
23. Patterson, C. H. and Messmer, R. P., Phys. Rev. Lett, in press.Google Scholar
24. Chelikowsky, J. R. and Phillips, J. C., Phys. Rev. B39, 5735 (1990).Google Scholar
25. Jarrold, M. F., Bower, J. E., and Creegan, K. M., J. Chem. Phys. 90, 3615 (1989).Google Scholar
26. Jarrold, M. F., Ray, U., and Creegan, K. M., J. Chem. Phys, 93, 224 (1990).Google Scholar
27. Ray, U., Jarrold, M. R., J. Chem. Phys, in press.Google Scholar
28. Jarrold, M. F., Ijiri, Y., Ray, U., J. Chem. Phys., in press.Google Scholar