In recent years there has been an enormous increase in the application of thin film technologies in the fabrication of solid state electrochemical devices. Devices in which thin film components are utilized are, e.g. solid oxide fuel cells (SOFCs), thin film rechargeable batteries, and chemical gas sensors. Chemical vapour deposition (CVD) is one of the synthesis techniques for the fabrication of thin film components for solid state electrochemical devices. This paper will focus on the application of novel CVD techniques for the fabrication of the thin film components of one of these devices, i.e. the solid oxide fuel cell. A new SOFC design concept which uses only one gas phase synthesis method will be presented.