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Experimental Contrast of Atomically-resolved Cc/Cs-corrected 20-80kV SALVE Images of 2D-objects Matches Calculations
Zhongbo Lee, Johannes Biskupek, Tibor Lehnert, Harald Rose, Martin Linck, Peter Hartel, Heiko Müller, Max Haider, Ute Kaiser
Journal: Microscopy and Microanalysis / Volume 22 / Issue S3 / July 2016
Published online by Cambridge University Press: 25 July 2016, pp. 894-895
Print publication: July 2016
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Performance of the SALVE-microscope: Atomic-resolution TEM Imaging at 20 kV
Martin Linck, Peter Hartel, Stephan Uhlemann, Frank Kahl, Heiko Müller, Joachim Zach, Johannes Biskupek, Marcel Niestadt, Ute Kaiser, Max Haider
Journal: Microscopy and Microanalysis / Volume 22 / Issue S3 / July 2016
Published online by Cambridge University Press: 25 July 2016, pp. 878-879
Print publication: July 2016
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On Proper Phase Contrast Imaging in Aberration Corrected TEM
Peter Hartel, Martin Linck, Frank Kahl, Heiko Müller, Max Haider
Journal: Microscopy and Microanalysis / Volume 20 / Issue S3 / August 2014
Published online by Cambridge University Press: 27 August 2014, pp. 926-927
Print publication: August 2014
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Towards High Resolution in TEM and STEM: What are the Limitations and Achievements
Max Haider, Stephan Uhlemann, Peter Hartel, Heiko Müller
Journal: Microscopy and Microanalysis / Volume 20 / Issue S3 / August 2014
Published online by Cambridge University Press: 27 August 2014, pp. 378-379
Print publication: August 2014
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Overview of Commercially Available CEOS Hexapole-type Aberration Correctors
Heiko Müller, Stephan Uhlemann, Peter Hartel, Joachim Zach, Max Haider
Journal: Microscopy and Microanalysis / Volume 20 / Issue S3 / August 2014
Published online by Cambridge University Press: 27 August 2014, pp. 934-935
Print publication: August 2014
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Correlation Length Scaling During the Early Stages of Epitaxial Growth
Niaz Haider, Mark R. Wilby, Dimitri D. Vvedensky
Journal: MRS Online Proceedings Library Archive / Volume 280 / 1992
Published online by Cambridge University Press: 25 February 2011, 135
Print publication: 1992
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We have calculated the height-height correlation function by means of Monte Carlo simulations of a solid-on-solid model. These simulations reveal that the position and sizes of the islands formed during the first half-monolayer are highly correlated, a feature which has also been noted in recent x-ray studies of growth by OMCVD. This morphology results in the emergence of a characteristic length, ℓ, in the correlation function, which is found to obey the scaling law ℓ = (D)/J)γ, where D is the diffusion length, and J is the deposition flux. The value of the exponent γ varies with coverage and depends on the growth conditions.

Some Personal Memories of Otto Scherzer
Dieter Typke, Harald Rose, Erich Plies, Max Haider
Journal: Microscopy Today / Volume 18 / Issue 4 / July 2010
Published online by Cambridge University Press: 07 July 2010, pp. 34-37
Print publication: July 2010
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At last year's M&M meeting, the birth centennial of Otto Scherzer, one of the pioneers of electron optics and particularly the correction of electron-optical lenses, was remembered in a special symposium. His scientific achievements have been extensively described in an article by Marko and Rose (2010). Here we try to recollect some personal memories of Otto Scherzer from the time we spent at the “Institut für theoretische Physik” at the Technische Hochschule Darmstadt (now Technische Universität Darmstadt).

Design of an Electron Optical System for the Correction of the Chromatic Aberration Cc of a TEM Objective Lens
Max Haider, Heiko Müller
Journal: Microscopy and Microanalysis / Volume 10 / Issue S03 / August 2004
Published online by Cambridge University Press: 01 August 2004, pp. 2-3
Print publication: August 2004
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Extended abstract of a paper presented at the Pre-Meeting Congress: Materials Research in an Aberration-Free Environment, at Microscopy and Microanalysis 2004 in Savannah, Georgia, USA, July 31 and August 1, 2004.

Cs Corrector for Imaging
Hidetaka Sawada, Takeshi Tomita, Toshikatsu Kaneyama, Fumio Hosokawa, Mikio Naruse, Toshikazu Honda, Peter Hartel, Max Haider, Nobuo Tanaka, Crispin J D Hetherington, Ron C Doole, Angus I Kirkland, John L Hutchison, John M Titchmarsh, David J H Cockayne
Journal: Microscopy and Microanalysis / Volume 10 / Issue S02 / August 2004
Published online by Cambridge University Press: 01 August 2004, pp. 976-977
Print publication: August 2004
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Extended abstract of a paper presented at Microscopy and Microanalysis 2004 in Savannah, Georgia, USA, August 1–5, 2004.

Electron Holography with Cs-corrected TEM
Hannes Lichte, Dorin Geiger, Michael Lehmann, Max Haider, Bert Freitag
Journal: Microscopy and Microanalysis / Volume 10 / Issue S02 / August 2004
Published online by Cambridge University Press: 01 August 2004, pp. 112-113
Print publication: August 2004
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Extended abstract of a paper presented at Microscopy and Microanalysis 2004 in Savannah, Georgia, USA, August 1–5, 2004.

Electron Holography with Cs-corrected TEM
Hannes Lichte, Dorin Geiger, Michael Lehmann, Max Haider, Bert Freitag
Journal: Microscopy and Microanalysis / Volume 10 / Issue S03 / August 2004
Published online by Cambridge University Press: 01 August 2004, pp. 40-41
Print publication: August 2004
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Extended abstract of a paper presented at the Pre-Meeting Congress: Materials Research in an Aberration-Free Environment, at Microscopy and Microanalysis 2004 in Savannah, Georgia, USA, July 31 and August 1, 2004.

Cs Corrector for Illumination
Hidetaka Sawada, Takeshi Tomita, Mikio Naruse, Toshikazu Honda, Peter Hartel, Max Haider, Crispin J D Hetherington, Ron C Doole, Angus I Kirkland, John L Hutchison, John M Titchmarsh, David J H Cockayne
Journal: Microscopy and Microanalysis / Volume 10 / Issue S02 / August 2004
Published online by Cambridge University Press: 01 August 2004, pp. 1004-1005
Print publication: August 2004
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Extended abstract of a paper presented at Microscopy and Microanalysis 2004 in Savannah, Georgia, USA, August 1–5, 2004.

State of the First Aberration-Corrected, Monochromized 200kV FEG-TEM
Gerd Benner, Marko Matijevic, Alexander Orchowski, Bernd Schindler, Max Haider, Peter Hartel
Journal: Microscopy and Microanalysis / Volume 9 / Issue S03 / September 2003
Published online by Cambridge University Press: 05 September 2003, pp. 38-39
Print publication: September 2003
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Current and Future Developments in order to Approach a Point Resolution of dpr ~ 0.5 Å with a TEM
Max. Haider
Journal: Microscopy and Microanalysis / Volume 9 / Issue S02 / August 2003
Published online by Cambridge University Press: 01 August 2003, pp. 930-931
Print publication: August 2003
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State of the first aberration-corrected, monochromized 200kV FEG-TEM
Gerd Benner, Alexander Orchowski, Max Haider, Peter Hartel
Journal: Microscopy and Microanalysis / Volume 9 / Issue S02 / August 2003
Published online by Cambridge University Press: 16 July 2003, pp. 938-939
Print publication: August 2003
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Experimental Set-up of a Purely Electrostatic Monochromator for High Resolution and Analytical Purposes of a 200 KV TEM
Stephan Uhlemann, Max. Haider
Journal: Microscopy and Microanalysis / Volume 8 / Issue S02 / August 2002
Published online by Cambridge University Press: 01 August 2002, pp. 584-585
Print publication: August 2002
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Realization of a Field Emission Gun with Advanced Köhler Illumination
Gerd Benner, Günter Lang, Alexander Orchowski, Wolf-Dieter Rau, Max Haider
Journal: Microscopy and Microanalysis / Volume 8 / Issue S02 / August 2002
Published online by Cambridge University Press: 01 August 2002, pp. 486-487
Print publication: August 2002
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17 results

Experimental Contrast of Atomically-resolved Cc/Cs-corrected 20-80kV SALVE Images of 2D-objects Matches Calculations

Performance of the SALVE-microscope: Atomic-resolution TEM Imaging at 20 kV

On Proper Phase Contrast Imaging in Aberration Corrected TEM

Towards High Resolution in TEM and STEM: What are the Limitations and Achievements

Overview of Commercially Available CEOS Hexapole-type Aberration Correctors

Correlation Length Scaling During the Early Stages of Epitaxial Growth

Some Personal Memories of Otto Scherzer

Design of an Electron Optical System for the Correction of the Chromatic Aberration Cc of a TEM Objective Lens

Cs Corrector for Imaging

Electron Holography with Cs-corrected TEM

Electron Holography with Cs-corrected TEM

Cs Corrector for Illumination

State of the First Aberration-Corrected, Monochromized 200kV FEG-TEM

Current and Future Developments in order to Approach a Point Resolution of dpr ~ 0.5 Å with a TEM

State of the first aberration-corrected, monochromized 200kV FEG-TEM

Experimental Set-up of a Purely Electrostatic Monochromator for High Resolution and Analytical Purposes of a 200 KV TEM

Realization of a Field Emission Gun with Advanced Köhler Illumination

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17 results