33 results
Hidden parameters in the plasma deposition of microcrystalline silicon solar cells
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- Journal:
- Journal of Materials Research / Volume 22 / Issue 7 / July 2007
- Published online by Cambridge University Press:
- 31 January 2011, pp. 1767-1774
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- July 2007
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Optimisation of Microcrystaline Silicon Deposited by Expanding Thermal Plasma Chemical Vapor Deposition for Solar-Cell Application
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- MRS Online Proceedings Library Archive / Volume 989 / 2007
- Published online by Cambridge University Press:
- 01 February 2011, 0989-A07-02
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- 2007
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Highly Efficient Microcrystalline Silicon Solar Cells Deposited from a Pure SiH4 Flow
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- MRS Online Proceedings Library Archive / Volume 910 / 2006
- Published online by Cambridge University Press:
- 01 February 2011, 0910-A26-01
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- 2006
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Novel in situ and real-time optical probes to detect (surface) defect states of a-Si:H
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- MRS Online Proceedings Library Archive / Volume 862 / 2005
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- 01 February 2011, A14.3
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- 2005
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Plasma-assisted Atomic Layer Deposition of TiN Films at low Deposition Temperature for High-aspect Ratio Applications
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- MRS Online Proceedings Library Archive / Volume 863 / 2005
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- 01 February 2011, B6.4
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- 2005
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New ultrahigh vacuum setup and advanced diagnostic techniques for studying a-Si:H film growth by radical beams
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- MRS Online Proceedings Library Archive / Volume 808 / 2004
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- 21 March 2011, A9.24
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- 2004
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Hydrogen Injection in ETP Plasma Jet for Fast-Deposition of High-Quality a-Si:H
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- MRS Online Proceedings Library Archive / Volume 808 / 2004
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- 21 March 2011, A9.54
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- 2004
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Roughness evolution of high-rate deposited a-SiNx:H films studied by atomic force microscopy and real time spectroscopic ellipsometry
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- MRS Online Proceedings Library Archive / Volume 808 / 2004
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- 21 March 2011, A9.35
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- 2004
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External rf substrate biasing during a-Si:H film growth using the expanding thermal plasma technique
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- MRS Online Proceedings Library Archive / Volume 808 / 2004
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- 21 March 2011, A9.21
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- 2004
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High-rate (> 1nm/s) and low-temperature (< 400°C) deposition of silicon nitride using an N2/SiH4 and NH3/SiH4 expanding thermal plasma
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- Journal:
- MRS Online Proceedings Library Archive / Volume 762 / 2003
- Published online by Cambridge University Press:
- 01 February 2011, A18.6
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- 2003
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Material Structure of Microcrystalline Silicon Deposited with an Expanding Thermal Plasma
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- Journal:
- MRS Online Proceedings Library Archive / Volume 762 / 2003
- Published online by Cambridge University Press:
- 01 February 2011, A.15.3
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- 2003
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Thin Film Cavity Ringdown Spectroscopy and Second Harmonic Generation on Thin a-Si:H Films
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- MRS Online Proceedings Library Archive / Volume 762 / 2003
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- 01 February 2011, A19.8
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- 2003
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Post-transit Analysis of Transient Photocurrents from High-Deposition-Rate a-Si:H Samples
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- MRS Online Proceedings Library Archive / Volume 762 / 2003
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- 01 February 2011, A19.6
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- 2003
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The a-Si:H Growth Mechanism: Temperature Study of the SiH3 Surface Reactivity and the Surface Silicon Hydride Composition During Film Growth
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- MRS Online Proceedings Library Archive / Volume 762 / 2003
- Published online by Cambridge University Press:
- 01 February 2011, A9.3
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- 2003
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Expanding thermal plasma for low-k dielectrics deposition
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- MRS Online Proceedings Library Archive / Volume 766 / 2003
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- 01 February 2011, E6.9
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- 2003
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On the Role of Surface Diffusion and Its Relation to the Hydrogen Incorporation During Hydrogenated Amorphous Silicon Growth
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- MRS Online Proceedings Library Archive / Volume 762 / 2003
- Published online by Cambridge University Press:
- 01 February 2011, A10.3
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- 2003
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Simulations of Buffer Layers in a-Si:H Thin Film Solar Cells Deposited with an Expanding Thermal Plasma
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- MRS Online Proceedings Library Archive / Volume 762 / 2003
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- 01 February 2011, A7.5
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- 2003
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Gas phase deposition of hybrid coatings
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- MRS Online Proceedings Library Archive / Volume 726 / 2002
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- 01 February 2011, Q9.9
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- 2002
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Expanding Thermal Plasma Deposition of Silicon Dioxide-Like Films for Microelectronic Devices
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- Journal:
- MRS Online Proceedings Library Archive / Volume 715 / 2002
- Published online by Cambridge University Press:
- 01 February 2011, A19.3
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- 2002
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High-rate a-Si:H and μc-Si:H Film Growth Studied by Advanced Plasma and in situ Film Diagnostics
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- Journal:
- MRS Online Proceedings Library Archive / Volume 715 / 2002
- Published online by Cambridge University Press:
- 01 February 2011, A25.6
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- 2002
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