10 results
Impact of curing condition on chemical stability of ultralow-k PMO material.
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- Journal:
- MRS Online Proceedings Library Archive / Volume 1428 / 2012
- Published online by Cambridge University Press:
- 30 July 2012, mrss12-1428-c02-07
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- 2012
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Pore sealing of SiOCH ultra low-k dielectrics with polyimide Langmuir-Blodgett film
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- Journal:
- MRS Online Proceedings Library Archive / Volume 1428 / 2012
- Published online by Cambridge University Press:
- 30 July 2012, mrss12-1428-c01-05
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- 2012
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Defects in Low-k Insulators (κ=2.5 – 2.0): ESR Analysis and Charge Injection
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- Journal:
- MRS Online Proceedings Library Archive / Volume 1335 / 2011
- Published online by Cambridge University Press:
- 18 August 2011, mrss11-1335-o04-04
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- 2011
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Ultra Low-k Materials Based on Self-Assembled Organic Polymers
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- Journal:
- MRS Online Proceedings Library Archive / Volume 1335 / 2011
- Published online by Cambridge University Press:
- 29 July 2011, mrss11-1335-o01-02
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- 2011
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Interaction of O and H Atoms with low-k SiOCH films pretreated in He plasma
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- Journal:
- MRS Online Proceedings Library Archive / Volume 1156 / 2009
- Published online by Cambridge University Press:
- 31 January 2011, 1156-D01-06
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- 2009
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Plasma Modification Of Si-O-Si Bond Structure in Porous Sioch Films
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- Journal:
- MRS Online Proceedings Library Archive / Volume 1079 / 2008
- Published online by Cambridge University Press:
- 01 February 2011, 1079-N07-03
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- 2008
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Characteristics of low-k and ultralow-k PECVD deposited SiCOH films.
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- Journal:
- MRS Online Proceedings Library Archive / Volume 716 / 2002
- Published online by Cambridge University Press:
- 01 February 2011, B12.3
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- 2002
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Characterization and Integration in Cu Damascene Structures of AURORA, an Inorganic Low-k Dielectric
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- Journal:
- MRS Online Proceedings Library Archive / Volume 612 / 2000
- Published online by Cambridge University Press:
- 17 March 2011, D5.14.1
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- 2000
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Calculation of Pore Size Distribution in the Ellipsometric Porosimetry: Method and Reliability
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- Journal:
- MRS Online Proceedings Library Archive / Volume 565 / 1999
- Published online by Cambridge University Press:
- 10 February 2011, 81
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- 1999
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Plasma etching of organic low-dielectric-constant polymers: comparative analysis
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- Journal:
- MRS Online Proceedings Library Archive / Volume 511 / 1998
- Published online by Cambridge University Press:
- 10 February 2011, 247
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- 1998
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