7 results
Atomic Layer Deposited Hybrid Organic-Inorganic Aluminates as Potential Low-k Dielectric Materials
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- Journal:
- MRS Online Proceedings Library Archive / Volume 1791 / 2015
- Published online by Cambridge University Press:
- 25 May 2015, pp. 15-20
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- 2015
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Processing, Characterization and Reliability of Silica Xerogel Films for Interlayer Dielectric Applications
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- Journal:
- MRS Online Proceedings Library Archive / Volume 612 / 2000
- Published online by Cambridge University Press:
- 17 March 2011, D5.25.1
- Print publication:
- 2000
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The Stability of TiH2 Used as Diffusion Barrier on SiO2 Substrates
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- Journal:
- MRS Online Proceedings Library Archive / Volume 337 / 1994
- Published online by Cambridge University Press:
- 25 February 2011, 217
- Print publication:
- 1994
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The Surface Damage in SiO2 Caused by Chemical Mechanical Polishing on Ic-60 Pads
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- Journal:
- MRS Online Proceedings Library Archive / Volume 337 / 1994
- Published online by Cambridge University Press:
- 25 February 2011, 157
- Print publication:
- 1994
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Copper Metallization Manufacturing Issues for Future ICs
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- Journal:
- MRS Online Proceedings Library Archive / Volume 337 / 1994
- Published online by Cambridge University Press:
- 25 February 2011, 41
- Print publication:
- 1994
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Reactions of Titanium Films with thin Silicon Dioxide, Nitride, and Oxynitride Films During Rapid Thermal Annealing
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- Journal:
- MRS Online Proceedings Library Archive / Volume 260 / 1992
- Published online by Cambridge University Press:
- 25 February 2011, 665
- Print publication:
- 1992
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Interaction of Copper Film with Silicides
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- Journal:
- MRS Online Proceedings Library Archive / Volume 181 / 1990
- Published online by Cambridge University Press:
- 25 February 2011, 537
- Print publication:
- 1990
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