2 results
Optimization of Material Removal Efficiency in Low Pressure CMP
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- Journal:
- MRS Online Proceedings Library Archive / Volume 1157 / 2009
- Published online by Cambridge University Press:
- 31 January 2011, 1157-E12-02
- Print publication:
- 2009
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- Article
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Contact Model for a Pad Asperity and a Wafer Surface in the Presence of Abrasive Particles for Chemical Mechanical Polishing
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- Journal:
- MRS Online Proceedings Library Archive / Volume 991 / 2007
- Published online by Cambridge University Press:
- 01 February 2011, 0991-C13-02
- Print publication:
- 2007
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- Article
- Export citation