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Investigating the Interfacial Properties of Hf-based/Si and SiO2/Si Gate Stacks
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- Journal:
- MRS Online Proceedings Library Archive / Volume 1155 / 2009
- Published online by Cambridge University Press:
- 31 January 2011, 1155-C09-12
- Print publication:
- 2009
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- Article
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Formation of a Thermally Stable NiSi FUSI Gate Electrode by a Novel Integration Process
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- Journal:
- MRS Online Proceedings Library Archive / Volume 958 / 2006
- Published online by Cambridge University Press:
- 01 February 2011, 0958-L06-08
- Print publication:
- 2006
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- Article
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