4 results
Electromigration Reliability of Dual-Damascene Cu/Oxide Interconnects
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- Journal:
- MRS Online Proceedings Library Archive / Volume 612 / 2000
- Published online by Cambridge University Press:
- 17 March 2011, D2.3.1
- Print publication:
- 2000
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- Article
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Deposition and Characterization of Porous Silica Xerogel Films
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- Journal:
- MRS Online Proceedings Library Archive / Volume 443 / 1996
- Published online by Cambridge University Press:
- 15 February 2011, 99
- Print publication:
- 1996
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- Article
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Process Integration Of Low-Dielectric-Constant Materials
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- Journal:
- MRS Online Proceedings Library Archive / Volume 381 / 1995
- Published online by Cambridge University Press:
- 15 February 2011, 197
- Print publication:
- 1995
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Process Integration and Manufacturasility Issues for High Performance Multilevel Interconnect
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- Journal:
- MRS Online Proceedings Library Archive / Volume 337 / 1994
- Published online by Cambridge University Press:
- 25 February 2011, 25
- Print publication:
- 1994
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