Surface chemistry and topography of materials are generally
preponderant factors in a series of material properties, such as
adhesion, wettability, friction and optical properties [1]. Wettability
of films, for example, can be altered significantly by modifying its
surface roughness and also by incorporating functional groups. Plasma
treatment is a powerful and versatile way to modify surface properties
of amorphous nitrogen-incorporated carbon thin films (a-C:H(N)) and
obtain materials with improved properties, once it is possible to modify
the surfaces in a controlled way by specific settings of plasma
conditions. [2 - 4]