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Study of Germanium Diffusion in HfO2 Gate Dielectric of MOS Device Application
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- Journal:
- MRS Online Proceedings Library Archive / Volume 829 / 2004
- Published online by Cambridge University Press:
- 26 February 2011, B9.26
- Print publication:
- 2004
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- Article
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Properties of Plasma Oxynitride Films On Strained Sige
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- Journal:
- MRS Online Proceedings Library Archive / Volume 446 / 1996
- Published online by Cambridge University Press:
- 10 February 2011, 133
- Print publication:
- 1996
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- Article
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