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Influence of the Ge Dose in Ion-implanted SiO2 Layers on the Related Nanocrystal-memory Properties
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- Journal:
- MRS Online Proceedings Library Archive / Volume 933 / 2006
- Published online by Cambridge University Press:
- 01 February 2011, 0933-G02-05
- Print publication:
- 2006
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- Article
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