5 results
Kinetic analysis and correlation with residual stress of the Ni/Si system in thin film
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- Journal:
- MRS Online Proceedings Library Archive / Volume 875 / 2005
- Published online by Cambridge University Press:
- 01 February 2011, O14.5
- Print publication:
- 2005
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Stress-Temperature Behavior and Stress Relaxation in Ti/Al-0.5%Cu/TiN and TiN/W Thin Films
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- Journal:
- MRS Online Proceedings Library Archive / Volume 403 / 1995
- Published online by Cambridge University Press:
- 15 February 2011, 657
- Print publication:
- 1995
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Electrical Activation of Heavily Doped Arsenic Implanted Silicon
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- Journal:
- MRS Online Proceedings Library Archive / Volume 128 / 1988
- Published online by Cambridge University Press:
- 25 February 2011, 599
- Print publication:
- 1988
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Defects Characterization of Arsenic Implanted Silicon by Ac Hall Effect Measurements
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- Journal:
- MRS Online Proceedings Library Archive / Volume 71 / 1986
- Published online by Cambridge University Press:
- 28 February 2011, 167
- Print publication:
- 1986
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