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Optimal thickness for Si interlayer as diffusion barrier at the Si3N4/GaAs interface: A transmission electron microscopy study
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- Journal:
- Journal of Materials Research / Volume 10 / Issue 5 / May 1995
- Published online by Cambridge University Press:
- 03 March 2011, pp. 1126-1133
- Print publication:
- May 1995
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- Article
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