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Measuring Thickness Changes in Thin Films Due to Chemical Reaction by Monitoring the Surface Roughness with In Situ Atomic Force Microscopy
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- Journal:
- Microscopy and Microanalysis / Volume 8 / Issue 5 / October 2002
- Published online by Cambridge University Press:
- 27 November 2002, pp. 422-428
- Print publication:
- October 2002
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- Article
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