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Effect of oxidation treatments on the redistribution of the boron in the thin films of polycrystalline silicon Si-LPCVD used in VLSI
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- Journal:
- The European Physical Journal - Applied Physics / Volume 25 / Issue 2 / February 2004
- Published online by Cambridge University Press:
- 19 January 2004, pp. 77-84
- Print publication:
- February 2004
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- Article
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