Modification of the non-assisted gas flow-line across the
target surface in a Grimm-type glow discharge source is described. The new
flow–line permits the gas to flow through a cylindrical annular space
ending with a disc-space annular gap, facing the target surface. This
configuration would cause directed jet assisted gas flow rays to impinge on
infinite points across the cathode surface. Improvement has been achieved in
the V-I characteristics where $\Delta V$/$\Delta I$ increases from 1.8 to
3.5 V/mA. The sputtering as well as simultaneous deposition rates, have
been increased by a factor of 16 and 17 respectively. These roll over with
increasing sputtering time, their maximum values at a characteristic time,
toc of 21 min. The toc value was constant for different operating
parameters provided that the source geometry assembly is kept fixed. The
presence of a glass substrate in the anode cavity has, apparently, no effect
on the obtained data. Improvements have also been achieved in the crater
profile, characterized by an approximately flat crater bottom with nearly
vertical walls, and less re-deposited particles on the crater depth and
edge. Fixing the distance Z of the substrate from target surface, along the
cell axis, and varying the deposition time from 1 to 30 min, a sequence of
changes in the deposited film were observed by X-ray diffraction and energy
dispersion X-ray (EDX). These changes start with an amorphous structure,
followed by the appearance of Cu and Zn crystallites and a probable
deposition of Cu5Zn8 clusters. The profile of the number of
sputtered particles at different Z values is characterized by a number of
peaks and troughs. This behavior has been explained by the occurrence of
local cluster-dissociation and formation, by different collision processes.
The improvements achieved by the application of the present jet assisted gas
flow can be of value in the analytical application of this type of glow
discharge.