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Reactive sputtering of YBaCuO thin films on polycrystalline zirconia substrates: optimization results*

Published online by Cambridge University Press:  15 January 1998

A. Degardin*
Affiliation:
Laboratoire de Génie Électrique de Paris, Universités Paris VI et Paris XI (URA 127 CNRS), Supélec, Plateau du Moulon, 91190 Gif-sur-Yvette, France
C. Bodin
Affiliation:
Laboratoire de Génie Électrique de Paris, Universités Paris VI et Paris XI (URA 127 CNRS), Supélec, Plateau du Moulon, 91190 Gif-sur-Yvette, France
C. Dolin
Affiliation:
Unité mixte de Physique CNRS/Thomson-CSF (UMR 137), Domaine de Corbeville, 91404 Orsay, France
A. Kreisler
Affiliation:
Laboratoire de Génie Électrique de Paris, Universités Paris VI et Paris XI (URA 127 CNRS), Supélec, Plateau du Moulon, 91190 Gif-sur-Yvette, France
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Abstract

In situ elaboration of YBaCuO thin films, on polycrystalline yttria doped zirconia substrates, has been optimized. A reactive sputtering model has been developed and the electrical conductivity of the substrate has been studied as a function of temperature and doping. The Jc value of $\approx 3\times 10^4~{\rm A/cm}^2$ at 77 K, measured on microbridges, is among the best reported in the literature for this substrate type.

Keywords

Type
Research Article
Copyright
© EDP Sciences, 1998

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Footnotes

*

This paper was presented at "4es Journées d'étude SEE - Matériaux Supraconducteurs à haute Tc" held at Caen the 26 and 27 March 1997.

References

* This paper was presented at "4es Journées d'étude SEE - Matériaux Supraconducteurs à haute T c" held at Caen the 26 and 27 March 1997.