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Quantitative determination of the doping level distribution in n-type GaAs using absorption mapping

  • P. J. Wellmann (a1), A. Albrecht (a1), U. Künecke (a1), B. Birkmann (a2), G. Mueller (a1) (a2) and M. Jurisch (a3)...

Abstract

We present an optical technique based on absorption measurements for the determination of the charge carrier concentration and its lateral distribution in n-type doped GaAs wafers. Calibration plots were determined in the charge carrier concentration range of 3 × 1017 m−3... 1 × 1018 cm−3 (range of trust up to 3 × 1018  cm−3) which is technically relevant for applications of GaAs wafers as substrate for laser and light emitting diodes. The error of the optical technique is in the range of 10% ... 15% and is comparable to electrical Hall measurements. The sensitivity of the setup, i.e. smallest detectable variation of doping (and hence charge carrier) concentration, is less than 1% in an area of 5 × 5 mm2 and about 20% across the 3 inch area. Absorption mappings of the charge carrier and hence doping homogeneity are presented for n-type GaAs:Si and GaAs:Te.

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