Hostname: page-component-76fb5796d-r6qrq Total loading time: 0 Render date: 2024-04-26T14:08:19.957Z Has data issue: false hasContentIssue false

OH kinetics in photo-triggered discharges used for VOCs conversion

Published online by Cambridge University Press:  27 May 2009

L. Magne*
Affiliation:
Laboratoire de Physique des Gaz et des Plasmas – CNRS UMR 8578, Université Paris-Sud, Bât. 210, 91405 Orsay Cedex, France
N. Blin-Simiand
Affiliation:
Laboratoire de Physique des Gaz et des Plasmas – CNRS UMR 8578, Université Paris-Sud, Bât. 210, 91405 Orsay Cedex, France
K. Gadonna
Affiliation:
Laboratoire de Physique des Gaz et des Plasmas – CNRS UMR 8578, Université Paris-Sud, Bât. 210, 91405 Orsay Cedex, France
P. Jeanney
Affiliation:
Laboratoire de Physique des Gaz et des Plasmas – CNRS UMR 8578, Université Paris-Sud, Bât. 210, 91405 Orsay Cedex, France
F. Jorand
Affiliation:
Laboratoire de Physique des Gaz et des Plasmas – CNRS UMR 8578, Université Paris-Sud, Bât. 210, 91405 Orsay Cedex, France
S. Pasquiers
Affiliation:
Laboratoire de Physique des Gaz et des Plasmas – CNRS UMR 8578, Université Paris-Sud, Bât. 210, 91405 Orsay Cedex, France
C. Postel
Affiliation:
Laboratoire de Physique des Gaz et des Plasmas – CNRS UMR 8578, Université Paris-Sud, Bât. 210, 91405 Orsay Cedex, France
Get access

Abstract

The kinetic of the hydroxyl radical is studied in N2/O2/H2O mixtures with small amounts of acetone or isopropyl alcohol (0.5%). The radical density is measured in absolute value in the afterglow of a photo-triggered discharge, which generates an homogeneous transient non-equilibrium plasma, using a time resolved absorption measurement method. For dry mixtures, experimental results are compared to predictions of a self-consistent 0D discharge and kinetic model. It is shown that dissociation of the VOCs through quenching collisions of nitrogen metastable states plays an important role in the production of OH. Measurements can not be explained looking only at the oxidation of acetone or IPA by the oxygen atom. This result is reinforced by experimental results about the OH density in wet mixtures, with or without VOCs, compared to dry ones.

Keywords

Type
Research Article
Copyright
© EDP Sciences, 2009

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

Rosocha, L., Korzekwa, R., J. Adv. Oxid. Technol. 4, 247 (1999)
Yan, K., van Heesch, E., Pemen, A., Huijbrechts, P., Plasma Chem. Plasma Process. 21, 107 (2001) CrossRef
Kim, H.-H., Plasma Process. Polym. 1, 91 (2004) CrossRef
Van Durne, J., Dewulf, J., Leys, C., Van Langenhove, H., Appl. Catal. B 78, 324 (2008) CrossRef
Magne, L., Pasquiers, S., Blin-Simiand, N., Postel, C., J. Phys. D 40, 3112 (2007) CrossRef
Lacour, B., Puech, V., Pasquiers, S., Recent Res. Devel. Appl. Phys. 6, 149 (2003)
Rozoy, M., Postel, C., Puech, V., Plasma Sources Sci. Technol. 8, 337 (1999) CrossRef
Fresnet, F., Baravian, G., Magne, L., Pasquiers, S., Postel, C., Puech, V., Rousseau, A., Plasma Sources Sci. Technol. 11, 152 (2002) CrossRef
J. Jarrige, N. Blin-Simiand, F. Jorand, L. Magne, S. Pasquiers, C. Postel, in Proc. XVIIth Int. Symp. on Plasma Chemistry, Toronto, Canada, 2005, edited by J. Mostahimi, T. Coyle, V. Pershin, H. Jazy, pp. 248–249
N. Blin-Simiand, F. Jorand, L. Magne, S. Pasquiers, C. Postel, in Proc. 5th Int. Symp. of Non-Thermal Plasma Technology for Pollution Control and Sustainable Development (ISNTPT-5), 2006, CD-ROM
O. Sarroukh, F. Jorand, C. Postel, L. Magne, S. Pasquiers, in Proc. XVIth Int. Conf. on Gas Discharges and their Applications (Xi'an Jiaotong University, Xi'an, China, 2006), pp. 417–420
Oda, T., Kumada, A., Tanaka, K., Masuda, S., J. Electrostat. 35, 93 (1995) CrossRef
Zlotopol'skii, V., Smolenskaya, T., High Energy Chem. 30, 188 (1996)
Oda, T., Yamashita, R., Haga, I., Takahashi, T., Masuda, S., IEEE Trans. Ind. Appl. 32, 118 (1996) CrossRef
Falkenstein, Z., J. Adv. Oxid. Technol. 2, 223 (1997)
Hsiao, M., Penetrante, B., Merritt, B., Vogtlin, G., Wallman, P., J. Adv. Oxid. Technol. 2, 306 (1997)
Sobacchi, M., Saveliev, A., Fridman, A., Gutsol, A., Kennedy, L., Plasma Chem. Plasma Process. 23, 347 (2003) CrossRef
Jarrige, J., Vervisch, P., J. Appl. Phys. 99, 113303 (2006) CrossRef
Malik, M., Xuan-Zhen, J., J. Environ. Sci. 10, 276 (1998)
Yamamoto, T., J. Haz. Mat. B 67, 165 (1999) CrossRef
Demidiouk, V., Chae, J., IEEE Trans. Plasma Sci. 33, 157 (2005) CrossRef
C-L. Chang, T.-S. Lin, Plasma Chem. Plasma Process. 25, 227 (2005) CrossRef
Holtzer, F., Kpinke, F., Roland, U., Plasma Chem. Plasma Process. 25, 595 (2005) CrossRef
Ch. Subrahmanyam, A. Renken, L. Kiwi-Minsker, Plasma Chem. Plasma Process. 27, 13 (2007) CrossRef
Besov, A., Vorontsov, A., Plasma Chem. Plasma Process. 27, 624 (2007) CrossRef
Brunet, H., Lacour, B., Rocca-Serra, J., Legentil, M., Mizzi, S., Pasquiers, S., Puech, V., J. Appl. Phys. 68, 4474 (1990) CrossRef
P. Ségur, M.-C. Bordage, Proc. XIXth Int. Conf. on Phenomena in Ionized Gases, edited by J. Labat, University of Beograd, Beograd, Serbia, 1989, p. 86, and references therein
Vacher, J.-R., Jorand, F., Blin-Simiand, N., Pasquiers, S., Int. J. Mass Spect. 273, 117 (2008) CrossRef
Vacher, J.-R., Blin-Simiand, N., Jorand, F., Pasquiers, S., Chem. Phys. 323, 587 (2006) CrossRef
A. Chouki, Ph.D. thesis, Université Paul Sabatier, France, 1994
W. Mallard, F. Westley, J. Herron, R. Hampson, D. Frizzell, NIST Chemical kinetics database, Version 2Q98, 1998
Kossyi, I., Kostinsky, A., Matveyev, A., Silakov, V., Plasma Sources Sci. Technol. 1, 207 (1992) CrossRef
Atkinson, R., Baulch, D., Cox, R., Hampson, R., Kerr, J., Rossi, M., Troe, J., J. Phys. Chem. Ref. Data 28, 191 (1999), and references therein CrossRef
Clark, W., Setser, D., J. Phys. Chem. 84, 2225 (1980) CrossRef
O. Sarroukh, F. Jorand, L. Magne, C. Postel, S. Pasquiers, in Proc. 5th Int. Symp. of Non-Thermal Plasma Technology for Pollution Control and Sustainable Development (ISNTPT-5), 2006, CD-ROM