Hostname: page-component-8448b6f56d-dnltx Total loading time: 0 Render date: 2024-04-19T21:22:59.676Z Has data issue: false hasContentIssue false

Nitrogen dissociation and parametric study in a magnetic pole enhanced inductively coupled Ar-N2 plasma (MaPE-ICP)

Published online by Cambridge University Press:  13 June 2013

M. Abrar*
Affiliation:
Department of Physics and Astronomy, Hazara University Mansehra, Pakistan
A.W. Khan
Affiliation:
Department of Physics, Gomal University, 29050 D.I. Khan, Pakistan
A. Saeed
Affiliation:
Department of Physics, Gomal University, 29050 D.I. Khan, Pakistan
S. Naseer
Affiliation:
Institute of Physics and Electronics, University of Peshawar, 25120 Peshawar, Pakistan
A. Qayyum
Affiliation:
National Tokamak Fusion Program, 3329 Islamabad, Pakistan
M. Zakaulah
Affiliation:
Department of Physics, Quaid-i-Azam University, 45230 Islamabad, Pakistan
*
Get access

Abstract

Inductively coupled Ar-N2 plasma is characterized by Langmuir probe and optical emission spectroscopy (OES). The plasma parameters including electron temperature, electron number density and electron energy probability functions (EEPFs) are determined by the Langmuir probe for different discharge parameters such as rf power (10–100 W), filling pressure (0.02–0.4 mbar) and argon content (5–95%) in nitrogen discharge. Spectroscopic measurements enable the evaluation of active species concentration ([N],[N2]) in ground electronic state and dissociation fraction. Concentration of active species is increased with the increase in filling pressure in nitrogen discharge keeping argon as an actinometer. It is noticed that the actinometry is an efficient and reliable technique to calculate the concentration of ground electronic state of nitrogen species. Moreover, for different plasma conditions, the molecular dissociation fraction is enhanced, as the Ar content is increased from 5% to 95% in nitrogen discharge. It is found that that dissociation fraction strongly depends on filling pressure and Ar content in nitrogen discharge. Maximum dissociation is observed for 95% Ar at filling pressure of 0.06 mbar. It is also found that the plasma parameters and active species concentration significantly depend on discharge parameters and may be optimized by appropriate selection of discharge conditions.

Type
Research Article
Copyright
© EDP Sciences, 2013

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

Saloum, S., Naddaf, M., Alkhaled, B., J. Phys. D: Appl. Phys. 41, 045205 (2008)CrossRef
Nakano, T., Kumagai, S., Samukawa, S., J. Appl. Phys. 92, 2990 (2002)CrossRef
Song, M.A., Lee, Y.W., Chung, T.H., Phys. Plasmas 18, 023504 (2011)CrossRef
Chung, C.W., Lee, Y.K., Ku, J.H., Plasma Source Sci. Technol. 20, 1 (2011)
Godyak, V.A., Demidov, V.I., J. Phys. D: Appl. Phys. 44, 233001 (2011)CrossRef
Khan, F.U., Rehman, N.U., Naseer, S., Naveed, M.A., Qayyum, A., Khattak, N.A.D., Zakaullah, M., Eur. Phys. J. Appl. Phys. 45, 11002 (2009)CrossRef
Donnelly, V.M., J. Phys. D: Appl. Phys. 37, R217 (2004)CrossRef
Abrar, M., Farwa, G.U., Naseer, S., Saeed, A., Khan, A.W., Iqbal, Z., Hussain, S.T., Zakaullah, M., Curr. Appl. Phys. 13, 567 (2013)CrossRef
Saeed, A., Khan, A.W., Jan, F., Abrar, M., Zakaullah, M., Appl. Surf. Sci. 273, 173 (2013)CrossRef
Abrar, M., Qayyum, A., Gilani, A.R., Khan, A.W., Saeed, A., Naseer, S., Zakaullah, M., Curr. Appl. Phys. (in press), DOI: 10.1016/j.cap.2013.01.024
Behringer, K., Fantz, U., J. Phys. D: Appl. Phys. 27, 2128 (1994)CrossRef
Czerwiec, T., Greer, F., Graves, D.B., J. Phys. D: Appl. Phys. 38, 4278 (2005)CrossRef
Itagaki, N., Iwata, S., Muta, K., Yonesu, A., Kawakami, S., Ishii, N., Kawai, Y., Thin Solid Films 435, 259 (2003)CrossRef
Meziani, T. et al., Plasma Source Sci. Technol. 10, 276 (2001)CrossRef
Meziani, T., Colpo, P., Rossi, F., J. Appl. Phys. 99, 033303 (2006)CrossRef
Ovsyannikov, A.A., Zhukov, M.F., Plasma Diagnostics (Cambridge International Science Pub., UK, 2000)Google Scholar
Rehman, N.U., Khan, F.U., Naseer, S., Murtaza, G., Hussain, S.S., Ahmad, I., Zakaullah, M., Plasma Sci. Technol. 13, 208 (2011)CrossRef
Thomaz, J.C., Amorim, J., Souza, C.F., J. Phys. D: Appl. Phys. 32, 3208 (1999)CrossRef
Laux, C.O., Kruger, C.H., J. Quant. Spectrosc. Radiat. 48, 9 (1992)CrossRef