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Large-area surface modification of polymers using a cold pulsed glow discharge

Published online by Cambridge University Press:  28 November 2011

J. Niu
Affiliation:
Liaoning Key Lab of Optoelectronic Films & Materials, Research Center for Optoelectronics, Dalian Nationalities University, Dalian 116600, P.R. China
D. Liu*
Affiliation:
Liaoning Key Lab of Optoelectronic Films & Materials, Research Center for Optoelectronics, Dalian Nationalities University, Dalian 116600, P.R. China Fujian Key Lab of Plasma and Magnetic Resonance, School of Physics and Mechanical and Electrical Engineering, Xiamen University, Xiamen 361005, P.R. China
J. Chen
Affiliation:
The School of Information and Communication Engineering, Dalian University of Technology, Dalian 116024, P.R. China
H. Ding
Affiliation:
Modern Analysis, Test and Research Centre, Heilongjiang Institute of Science and Technology, Harbin 150027, P.R. China
Y. Wu
Affiliation:
Liaoning Key Lab of Optoelectronic Films & Materials, Research Center for Optoelectronics, Dalian Nationalities University, Dalian 116600, P.R. China
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Abstract

In this study, we reported a plasma method to generate the cold pulsed glow discharge for large-area surface modifications of various polymers, such as polyethylene (PE), polyethylene terephthalate (PET), polypropylene (PP), and polytetrafluoroethylene (PTFE). The cold plasmas consisting of pulsed and glow-like breakdowns with peak widths of several microseconds may efficiently prevent the heat-sensitive materials from being damaged and greatly improve the surface properties of treated polymers. Analysis indicates that discharge parameters, such as the discharge pressure and gas compositions, may significantly influence the density of radicals or ions generated near the polymer surface, and their energy, which in turn determine the surface properties of treated polymers, such as surface chemical compositions and hydrophobicity. The reaction processes of activated species, such as radicals and energetic ions at the surfaces of treated polymers, are discussed based on the obtained experimental results. Compared to many other plasma techniques formed at high pressure or with a long discharge distance, the low-pressure plasmas generated through small gas spacing from this design may result in the efficient and frequent collisions between the polymer surface and activated species, thus demonstrating an efficient usage of electric energy and feed gas.

Type
Research Article
Copyright
© EDP Sciences, 2011

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References

Chan, C.-M., Ko, T.-M., Hiraoka, H., Surf. Sci. Rep. 24, 1 (1996)CrossRef
Sarra-Bournet, C., Turgeon, S., Mantovani, D., Laroche, G., Plasma Process. Polym. 3, 506 (2006)CrossRef
Piskarev, M.S., Batuashvili, M.R., Gilman, A.B., High Energy Chem. 44, 534 (2010)CrossRef
Bartnik, A. et al., Appl. Phys. A: Mater. Sci. Process. 1, 61 (2010)CrossRef
Borcia, G., Anderson, C.A., Brown, N.M.D., Plasma Source. Sci. Technol. 14, 259 (2005)CrossRef
Little, U., Buchanan, F., Harkin-Jones, E., Graham, B., Fox, B., Boyd, A., Meenan, B., Dickson, G., Acta Biomater. 5, 2025 (2009)CrossRef
Sarra-Bournet, C., Turgeon, S., Mantovani, D., Laroche, G., J. Phys. D: Appl. Phys. 39, 3461 (2006)CrossRef
Choi, J.H., Lee, T.I., Han, I., Baik, H.K., Song, K.M., Lim, Y.S., Lee, E.S., Plasma Source. Sci. Technol. 15, 416 (2006)CrossRef
Niu, J., Liu, D., Ou, Y., You, Y., Yu, N., Chem. Vap. Deposition 16, 203 (2010)CrossRef
De Geyter, N., Morent, R., Gengembre, L., Leys, C., Payen, E., Vlierberghe, S.V., Schacht, E., Plasma Chem. Plasma Process. 28, 289 (2008)CrossRef
Beamson, G., Briggs, D., High Resolution XPS of Organic Polymers (Wiley, Chichester, 1992)Google Scholar
De Geyter, N., Morent, R., Leys, C., Gengembre, L., Payen, E., Van Vlierberghe, S., Schacht, E., Surf. Coat. Technol. 202, 3000 (2008)CrossRef
Golub, M.A., Wydeven, T., in Fluorinated Surfaces, Coatings and Films, edited by Castner, G., Grainger, D.W., ACS Symp. Ser. 787 (Amer. Chem. Soc., Washington, D.C., 2001) pp. 203212CrossRefGoogle Scholar
Gherardi, N., Croquesel, E., Massines, F., in 16th Int. Symp. On Plasma Chemstry, Taormina, 2003
Sira, M., Trunec, D., Stahel, P., Bursikova, V., Navratil, Z., Bursik, J., J. Phys. D: Appl. Phys. 38, 621 (2004)CrossRef
Guimond, S., Radu, I., Czeremuszkin, G., Carlsson, D.J., Wertheimer, M.R., Plasmas Polym. 7, 71 (2002)CrossRef
Murata, T., Tatsukawa, M., Okita, Y., Yasuoka, K., Ozone Sci. Eng. 17, 575 (1995)CrossRef
Liu, D., Ma, T., Yu, S., Xu, Y., Yang, X., J. Phys. D: Appl. Phys. 34, 1651 (2001)CrossRef
Yuji, T., Fujioka, K., Fujii, S., Akatsuka, H., IEEE Trans. Electr. Electric Eng. 2, 473 (2007)CrossRef
Motrescu, I., Ogino, A., Tanaka, S., Fujiwara, T., Kodani, S., Kawagishi, H., Popa, G., Nagatsu, M., Thin Solid Films 518, 3585 (2010)CrossRef
Gupta, B., Hilborn, J., Hollenstein, Ch., Plummer, C.J.G., Houriet, R., Xanthopoulos, N., J. Appl. Polymer Sci. 78, 1083 (2000)3.0.CO;2-5>CrossRef
Papageorghiou, L., Panousis, E., Loiseau, J.F., Spyrou, N., Held, B., J. Phys. D 42, 105201 (2009)CrossRef
Borcia, G., Chiper, A., Rusu, I., Plasma Source. Sci. Technol. 15, 849 (2006)CrossRef
Koemtzopoulos, C.R., Economou, D.J., Polland, R., Diamond Relat. Mater. 2, 25 (1993)CrossRef
Zipf, E.C., Mclaughlin, R.W., Planet. Space Sci. 26, 449 (1978)CrossRef
Khan, F.U., Rehman, N.U., Naseer, S., Naveed, M.A., Qayyum, A., Khattak, N.A.D., Zakaullah, M., Eur. Phys. J. Appl. Phys. 45, 11002 (2009)CrossRef
Sakamoto, T., Matsuura, H., Akatsuka, H., J. Appl. Phys. 101, 23307 (2007)CrossRef
Sarra-Bournet, C., Ayotte, G., Turgeon, S., Massines, F., Laroche, G., Langmuir 25, 9432 (2009)CrossRef
Kuppers, A., Surf. Sci. Rep. 22, 250 (1995)CrossRef
Muller, K.-H., J. Vac. Sci. Technol. 226, 30 (1993)
Liu, D., Fisher, E.R., J. Vac. Sci. Technol. A 25, 368 (2007)CrossRef
Borcia, G., Anderson, C.A., Brown, N.M.D., Plasma Source. Sci. Technol. 14, 259 (2005)CrossRef