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Computational study of sheath structure in chemically active plasmas

Published online by Cambridge University Press:  28 October 2011

P. Cerny ,
S. Novak ,
R. Hrach  and
V. Hrachova
P. Cerny
Affiliation:
J.E. Purkinje University, Faculty of Science, Department of Physics, Ceske mladeze 8, 40096 Usti nad Labem, Czech Republic
S. Novak*
Affiliation:
J.E. Purkinje University, Faculty of Science, Department of Physics, Ceske mladeze 8, 40096 Usti nad Labem, Czech Republic
R. Hrach
Affiliation:
J.E. Purkinje University, Faculty of Science, Department of Physics, Ceske mladeze 8, 40096 Usti nad Labem, Czech Republic Charles University, Faculty of Mathematics and Physics, Department of Surface and Plasma Science, V Holesovickach 2, 18000 Prague 8, Czech Republic
V. Hrachova
Affiliation:
Charles University, Faculty of Mathematics and Physics, Department of Surface and Plasma Science, V Holesovickach 2, 18000 Prague 8, Czech Republic
*
ae-mail: Stanislav.Novak@ujep.cz
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Abstract

Results of computer simulations describing an interaction between a low-temperature multicomponent plasma and an immersed metal substrate are presented. For this purpose, computer model of volume processes in a DC glow discharge in Ar-O2 mixture and a particle model of plasma-solid interaction were created. The interaction is studied not only in case when a constant value of voltage bias on the immersed substrate is kept, but also when sinusoidal voltage bias is applied. A pressure dependence of the sheath region in electronegative plasma is shown, too.

Type
Research Article
Information
The European Physical Journal - Applied Physics , Volume 56 , Issue 2: Topical Issue: 18th International Colloquium on Plasma Processes (CIP 2011) , November 2011 , 24006
Copyright
© EDP Sciences, 2011

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