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Computational study of sheath structure in chemically active plasmas

  • P. Cerny (a1), S. Novak (a1), R. Hrach (a1) (a2) and V. Hrachova (a2)


Results of computer simulations describing an interaction between a low-temperature multicomponent plasma and an immersed metal substrate are presented. For this purpose, computer model of volume processes in a DC glow discharge in Ar-O2 mixture and a particle model of plasma-solid interaction were created. The interaction is studied not only in case when a constant value of voltage bias on the immersed substrate is kept, but also when sinusoidal voltage bias is applied. A pressure dependence of the sheath region in electronegative plasma is shown, too.


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[1]Ostrikov, K., Tsakadze, Z., Rutkevych, P.P., Long, J.D., Xu, S., Denysenko, I., Contrib. Plasma Phys. 45, 514 (2005)
[2]Birdsall, C.K., Langdon, A.B., Plasma Physics via Computer Simulation (IoP Publishing, Bristol, Philadelphia, 1991)
[3]Wendt, J.F. (ed.), Computational Fluid Dynamics – An Introduction (Springer, New York, 1992), pp. 3149
[4]Hrachova, V., Kanka, A., in Proc. of XIIIth ISPC, Beijing, China, 1997, vol. II, p. 517
[5]Hrach, R., Hrachova, V., Vicher, M., Simek, J., in Proc. of 16th ISPC, Taormina, Italy, 2003, p. 145
[6]Franklin, R.N., J. Phys. D: Appl. Phys. 36, 2655 (2003)
[7]Lieberman, M.A., Lichtenberg, A.J., Principles of Plasma Discharges and Materials Processing (Wiley, New York, 1994)
[8]Eliasson, B., Kogelschatz, U., Basic Data for Modelling of Electrical Discharges in Gases: Oxygen (Brown Boveri Konzernforschung, Baden, 1986)
[9]Ionin, A.A., Kochetov, I.V., Napartovich, A.P., Yuryshev, N.N., J. Phys. D: Appl. Phys. 40, R25 (2007)
[10]Hsu, C.-C., Nierode, M.A., Coburn, J.W., Graves, D.B., J. Phys. D: Appl. Phys. 39, 3272 (2006)
[11]Jacobs, H., Miethke, F., Rutscher, A., Wagner, H.E., Contrib. Plasma Phys. 36, 471 (1996)
[12]Lee, C., Lieberman, M.A., J. Vac. Sci. Technol. A 13, 368 (1995)
[13]Baguer, N., Bogaerts, A., Donko, Z., Gijbels, R., Sadeghi, N., J. Appl. Phys. 97, 123305 (2005)
[14]Palop, J.I.F., Ballesteros, J., Hernandez, M.A., Morales Crespo, R., Borrego del Pino, S., J. Appl. Phys. 95, 4585 (2004)
[16]Bronold, F.X., Matyash, K., Tskhakaya, D., Schneider, R., Fehske, H., J. Phys. D: Appl. Phys. 40, 6583 (2007)
[17]Hockney, R.W., Eastwood, J.W., Computer Simulation Using Particles (Taylor and Francis, Bristol, 1988)
[18]Shewchuk, J.R., An Introduction to the Conjugate Gradient Method Without the Agonizing Pain, Technical Report: CS-94-125, Carnegie Mellon University, Pittsburgh, 1994
[19]Snir, M., Otto, S., Huss-Lederman, S., Walker, D., Dongarra, J., MPI: The Complete Reference (MIT, Massachusetts, 1996)
[20]Kanka, A., Ph.D. thesis, Charles University, Prague, 1996
[21]Kutasi, K., Guerra, V., Sa, P., J. Phys. D: Appl. Phys. 43, 175201 (2010)

Computational study of sheath structure in chemically active plasmas

  • P. Cerny (a1), S. Novak (a1), R. Hrach (a1) (a2) and V. Hrachova (a2)


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