Hostname: page-component-84b7d79bbc-x5cpj Total loading time: 0 Render date: 2024-07-26T08:48:12.714Z Has data issue: false hasContentIssue false

Two-dimensional modelling of CH4-H2 radio-frequency discharges for a-C:H deposition

Published online by Cambridge University Press:  15 November 2001

O. Leroy*
Affiliation:
Laboratoire de Physique des Gaz et des Plasmas, Université Paris XI, bâtiment 212, 91405 Orsay Cedex, France
H. Videlot
Affiliation:
Laboratoire de Physique et Technologie des Plasmas, École Polytechnique, 91128 Palaiseau Cedex, France
J. Jolly
Affiliation:
Laboratoire de Physique et Technologie des Plasmas, École Polytechnique, 91128 Palaiseau Cedex, France
Get access

Abstract

A two-dimensional numerical code, previously developed for the modelling of a-Si:H deposition in a SiH4/H2 radio frequency cylindrical PECVD reactor, has been modified in order to perform the modelling of CH4/H2 mixtures in the same experimental configuration. This model, which includes electrical and chemical modules, takes into account the transport and the chemistry of the charged and neutral species. The results of the models have been compared to measurements. The calculated electrical power coupled to the plasma and the self-bias voltages are compared to the experimental ones. The calculated radical densities are compared to those measured by threshold ionization mass spectroscopy at the substrate centre. Moreover, the calculated radial distribution of the deposition rate is compared to profilometry measurements. Eventually, results obtained here in CH4/H2 are compared with those previously obtained in SiH4/H2 plasmas under similar experimental conditions.

Keywords

Type
Research Article
Copyright
© EDP Sciences, 2001

Access options

Get access to the full version of this content by using one of the access options below. (Log in options will check for institutional or personal access. Content may require purchase if you do not have access.)

References

Tachibana, K., Nishida, N., Harima, H., Urano, Y., J. Phys. D Appl. Phys. 17, 1727 (1984). CrossRef
Kline, L.E., Partlow, W.D., Bies, W.E., J. Appl. Phys. 65, 70 (1989). CrossRef
Bou, P., Boettnet, J.C., Vandenbulcke, L., Jpn. J. Appl. Phys. 31, 1505 (1992). CrossRef
Gogolides, E., Buteau, C., Rhallabi, A., Turban, G., J. Phys. D Appl. Phys. 27, 818 (1994). CrossRef
Möller, W., Fukarek, W., Lange, K., von Keudell, A., Jacob, W., Jpn. J. Appl. Phys. 34, 2163 (1995). CrossRef
Rhallabi, A., Catherine, Y., IEEE Trans. Plasma Sci. 19, 270 (1991). CrossRef
Kushner, M.J., J. Appl. Phys. 63, 2532 (1988). CrossRef
Bera, K., Farouk, B., Lee, Y.H., Plasma Sources Sci. Technol. 8, 412 (1999). CrossRef
Leroy, O., Gousset, G., Alves, L.L., Perrin, J., Jolly, J., Plasma Sources Sci. Technol. 7, 348 (1998). CrossRef
Finger, F., Kroll, U., Viret, V., Shah, A., Tang, X.M., Weber, J., Howling, A., Hollenstein, Ch., J. Appl. Phys. 71, 5665 (1992). CrossRef
Kae-Nune, P., Perrin, J., Guillon, J., Jolly, J., Plasma Sources Sci. Technol. 4, 250 (1995). CrossRef
Leroy, O., Perrin, J., Jolly, J., Péalat, M., Lefebvre, M., J. Phys. D Appl. Phys. 30, 499 (1997). CrossRef
Boeuf, J.P., Pitchford, L.C., Phys. Rev. E 51, 1376 (1995). CrossRef
M.C. Bordage, thèse de Doctorat, Université Paul Sabatier, Toulouse, France, 1995.
W. Hackbusch, Multi-Grid Methods and Applications (Springer, Berlin, 1985).
J.O. Hirschfelder, C.F. Curtiss, R.B. Bird, Molecular Theory of Gases and Liquids (Wiley, New York, 1964), Chap. 7.
Perrin, J., Leroy, O., Bordage, M.C., Contrib. Plasma Phys. 36, 3 (1996). CrossRef
Coltrin, M.E., Kee, R.J., Miller, J.A., J. Electrochem. Soc. 133, 1206 (1986). CrossRef
R.A. Svehla, NASA Report, NASA-TR 132 (1962).
Matsui, Y., Yuuki, A., Morita, N., Tachibana, K., Jpn. J. Appl. Phys. 26, 1575 (1987). CrossRef
Gallagher, A., J. Appl. Phys. 60, 1369 (1986). CrossRef
J.B. Hasted, Physics of Atomic Collisions (Butterworths, London, 1964), p. 372.
Urquijo, J., Dominguez, I., Alvarez, I., Cisneros, C., J. Phys. B At. Mol. Opt. Phys. 30, 4395 (1997). CrossRef
D. Alman, D. Ruzic, Private communication at GEC 98.
Nakano, T., Toyoda, H., Sugai, H., Jpn. J. Appl. Phys. 30, 2912 (1991). CrossRef
Melton, C.E., Rudolph, P.S., J. Chem. Phys. 47, 1771 (1967). CrossRef
Winters, H.F., Chem. Phys. 36, 353 (1979). CrossRef
H. Tawara, Y. Itikawa, H. Nishimura, H. Tanaka, Y. Nakamura, Research Report NIFS-DATA Series (1990).
Tahara, H., Minami, K.I., Murai, A., Yasui, T., Yoshikawa, T., Jpn. J. Appl. Phys. 34, 1972 (1995). CrossRef
Tsang, W., Hampson, R.F., J. Phys. Chem. Ref. Data 15, 1087 (1986). CrossRef
Baulch, D.L., Cobos, C.J., Cox, R.A., Frank, P., Hayman, G., Kerr, Th., Just, J.A., Murrels, T., Pilling, M.J., Troe, J., Walker, R.W., Warnatz, J., J. Phys. Chem. Ref. Data 23, 847 (1994). CrossRef
Sugai, H., Toyoda, H., J. Vac. Sci. Technol. A 10, 1193 (1992). CrossRef
von Keudell, A., Möller, W., J. Appl. Phys. 75, 7718 (1994). CrossRef
Mantzaris, N.V., Gogolides, E., Boudouvis, A.G., Rhallabi, A., Turban, G., J. Appl. Phys. 79, 3718 (1996). CrossRef
Perrin, J., Shiratani, M., Kae-Nune, P., Videlot, H., Jolly, J., Guillon, J., J. Vac. Sci. Technol. A 16, 278 (1998). CrossRef
Kojima, H., Toyoda, H., Sugai, H., Appl. Phys. Lett. 55, 1292 (1989). CrossRef
Kae-Nune, P., Perrin, J., Jolly, J., Guillon, J., Surf. Sci. 360, L495 (1996). CrossRef
Leroy, O., Stratil, P., Perrin, J., Jolly, J., Belenguer, Ph., J. Phys. D Appl. Phys. 28, 500 (1995). CrossRef