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Synthesis, structural and electrical characterizations of Er0.33Sr1.67Ni0.8Cu0.2O4−δ

Published online by Cambridge University Press:  30 November 2012

Salwa Hamdi ,
Samia Ouni ,
Hanen Chaker  and
Rached Ben Hassen
Salwa Hamdi
Affiliation:
Unité de Recherche de Chimie des Matériaux et de l'Environnement (UR11ES25), ISSBAT, Université de Tunis El Manar, 9, Avenue Dr. Zoheir Safi, 1006 Tunis, Tunisie
Samia Ouni
Affiliation:
Unité de Recherche de Chimie des Matériaux et de l'Environnement (UR11ES25), ISSBAT, Université de Tunis El Manar, 9, Avenue Dr. Zoheir Safi, 1006 Tunis, Tunisie
Hanen Chaker
Affiliation:
Unité de Recherche de Chimie des Matériaux et de l'Environnement (UR11ES25), ISSBAT, Université de Tunis El Manar, 9, Avenue Dr. Zoheir Safi, 1006 Tunis, Tunisie
Rached Ben Hassen*
Affiliation:
Unité de Recherche de Chimie des Matériaux et de l'Environnement (UR11ES25), ISSBAT, Université de Tunis El Manar, 9, Avenue Dr. Zoheir Safi, 1006 Tunis, Tunisie
*
a)Author to whom correspondence should be addressed. Electronic mail: rached.benhassen@fss.rnu.tn
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Abstract

A new compound Er0.33Sr1.67Ni0.8Cu0.2O4−δ (ErSr5Ni2.4Cu0.6O11) was prepared using the conventional solid state method and annealed at 1423 K in 1 atm of oxygen gas flow. The oxygen non-stoichiometry (δ = 0.47) was determined by iodometric titration. Rietveld refinement using powder X-ray diffraction data confirms that the sample adopts the K2NiF4-type structure (space group I4/mmm (Z = 2), a = 3.760 56(4) and c = 12.3889(1) Ǻ). The final reliability factors were: Rwp = 10.75%, χ2 = 2.51, Rp = 14.80%, RB = 4.77% and RF = 2.73%. Four probe electrical resistivity measurements were performed vs. temperature in the range of 320–540 K. A semiconducting behaviour over the whole range of temperature, with a maximum conductivity of 0.026 S cm−1 is observed at 439 K.

Keywords

Rietveld refinementK2NiF4-type structureelectrical resistivityErSr5Ni2.4Cu0.6O11iodometric titration
Type
Technical Articles
Information
Powder Diffraction , Volume 27 , Issue 4 , December 2012 , pp. 252 - 255
Copyright
Copyright © International Centre for Diffraction Data 2012

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