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Aerosol filter analysis using polarized optics EDXRF with thin-film FP method

Published online by Cambridge University Press:  17 April 2014

Takao Moriyama ,
Atsushi Morikawa ,
Makoto Doi  and
Scott Fess
Takao Moriyama*
Affiliation:
Rigaku Corporation, Osaka 569-1146, Japan
Atsushi Morikawa
Affiliation:
Rigaku Corporation, Osaka 569-1146, Japan
Makoto Doi
Affiliation:
Rigaku Corporation, Osaka 569-1146, Japan
Scott Fess
Affiliation:
Applied Rigaku Technologies, Inc., Austin, Texas 78717
*
a)Author to whom correspondence should be addressed. Electronic mail: t-moriya@rigaku.co.jp
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Abstract

Interest in atmospheric aerosol issues has been increasing worldwide. X-ray fluorescence (XRF) is an important atmospheric aerosol monitoring tool for inorganic component analysis, because XRF is a rapid and easy analysis method. In particular, Energy dispersive X-ray fluorescence (EDXRF) has drawn attention for aerosol analysis. However, EDXRF has difficulties that: (1) many overlapping peaks exist for aerosol filter analysis and (2) many thin-film standard samples are required when an empirical calibration method is employed. Accurate analysis method of aerosol filter samples without the need for large sets of standards by semi-quantitative analysis software RPF–SQX (Rigaku profile fitting–spectra quant X), which includes the exact profile fitting and thin-film fundamental parameter (FP) method, is described using the EDXRF spectrometer equipped with secondary targets and polarized optics.

Keywords

AerosolFilter sampleElemental analysisPolarized optics EDXRFThin-film FP
Type
Technical Articles
Information
Powder Diffraction , Volume 29 , Issue 2 , June 2014 , pp. 137 - 140
Copyright
Copyright © International Centre for Diffraction Data 2014 

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