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Aerosol filter analysis using polarized optics EDXRF with thin-film FP method

Published online by Cambridge University Press:  17 April 2014

Takao Moriyama ,
Atsushi Morikawa ,
Makoto Doi  and
Scott Fess
Takao Moriyama*
Affiliation:
Rigaku Corporation, Osaka 569-1146, Japan
Atsushi Morikawa
Affiliation:
Rigaku Corporation, Osaka 569-1146, Japan
Makoto Doi
Affiliation:
Rigaku Corporation, Osaka 569-1146, Japan
Scott Fess
Affiliation:
Applied Rigaku Technologies, Inc., Austin, Texas 78717
*
a)Author to whom correspondence should be addressed. Electronic mail: t-moriya@rigaku.co.jp
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Abstract

Interest in atmospheric aerosol issues has been increasing worldwide. X-ray fluorescence (XRF) is an important atmospheric aerosol monitoring tool for inorganic component analysis, because XRF is a rapid and easy analysis method. In particular, Energy dispersive X-ray fluorescence (EDXRF) has drawn attention for aerosol analysis. However, EDXRF has difficulties that: (1) many overlapping peaks exist for aerosol filter analysis and (2) many thin-film standard samples are required when an empirical calibration method is employed. Accurate analysis method of aerosol filter samples without the need for large sets of standards by semi-quantitative analysis software RPF–SQX (Rigaku profile fitting–spectra quant X), which includes the exact profile fitting and thin-film fundamental parameter (FP) method, is described using the EDXRF spectrometer equipped with secondary targets and polarized optics.

Keywords

AerosolFilter sampleElemental analysisPolarized optics EDXRFThin-film FP
Type
Technical Articles
Information
Powder Diffraction , Volume 29 , Issue 2 , June 2014 , pp. 137 - 140
Copyright
Copyright © International Centre for Diffraction Data 2014 

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References

Campbell, J. L. and Wang, J.-X. (1992). “Lorentzian contributions to X-ray lineshapes in Si(Li) spectroscopy”, X-Ray Spectrom. 21, 223–227.Google Scholar
Hara, S., Kawahara, N., Matsuo, T., and Doi, M. (2010). “Development of Quantification Method using Fundamental Parameter Method for EDXRF”, DXC2010, Denver.Google Scholar
Kataoka, Y. (1989). “Standardless X-ray fluorescence spectrometry (Fundamental parameter method using sensitivity library)”, Rigaku J. 6, 33–39.Google Scholar
Kataoka, Y. and Arai, T. (1990). “Basic studies of multi-layer thin film analysis using fundamental parameter method”, Adv. X-Ray Anal. 33, 213–223.Google Scholar
Moriyama, T., Ikeda, S., Doi, M., and Fess, S. (2011). “Trace element analysis using EDXRF with polarized optics”, Adv. X-Ray Anal. 54, 289–298.Google Scholar
Okuda, T., Takada, H., Kumata, H., Nakajima, F., Hatakeyama, S., Uchida, M., Tanaka, S., He, K., and Ma, Y. (2013). “Inorganic chemical characterization of aerosols in four Asian mega-cities”, Aerosol Air Qual. Res. 13(2), 436–449.CrossRefGoogle Scholar
Shiraiwa, T. and Fujino, N. (1969). “Theoretical formulas for film thickness measurement by means of fluorescence X-rays”, Adv. X-Ray Anal. 12, 446.Google Scholar