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Preparation of Bi4Te3 highly oriented nanopillars array film with enhanced electrical properties

Published online by Cambridge University Press:  12 April 2018

Jing Wu
Affiliation:
School of Physics and Optoelectronic Engineering, Guangdong University of Technology, WaiHuan Xi Road, No. 100, Guangzhou 510006, China
Jikang Jian*
Affiliation:
School of Physics and Optoelectronic Engineering, Guangdong University of Technology, WaiHuan Xi Road, No. 100, Guangzhou 510006, China
Shufang Wang
Affiliation:
Hebei Key Lab of Optic-Electronic Information and Materials, The College of Physics Science and Technology, Hebei University, Baoding 071002, China
Shuang Guo
Affiliation:
Hebei Key Lab of Optic-Electronic Information and Materials, The College of Physics Science and Technology, Hebei University, Baoding 071002, China
Renbo Lei
Affiliation:
School of Physics and Optoelectronic Engineering, Guangdong University of Technology, WaiHuan Xi Road, No. 100, Guangzhou 510006, China
Haitao Liu
Affiliation:
Department of Physics, Xinjiang University, Urumqi 830046, Xinjiang, China
*
a)Author to whom correspondence should be addressed. Electronic mail: jianjikang@126.com

Abstract

The Bi4Te3 films with well-ordered orientation and microstructure were successfully prepared on SiO2 substrate by a vacuum thermal evaporation deposition technique for the first time. We discussed the effects of evaporation temperature and substrate temperature on the phase and its well-ordered growth of Bi4Te3 films. The formation of Bi4Te3 phase is owing to the differences of the saturated vapor pressure. The thermoelectric transport properties of the Bi4Te3 films were investigated and the (00l)-oriented nanopillars array film has a better electrical transport performance, whose value of PF is 0.032 mWm−1 K−2 at 339 K, approaching twice that of the non-oriented ordinary film. The enhanced electrical properties of Bi4Te3 films could be achieved via the high-crystallinity well-controlled (00l)-oriented nanopillars array.

Type
Technical Article
Copyright
Copyright © International Centre for Diffraction Data 2018 

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