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ZnO nanorods grown by a Pulsed Laser Deposition process

Published online by Cambridge University Press:  01 February 2011

Jae-Hwan Park
Affiliation:
Materials Science and Technology Division, Korea Institute of Science and Technology, PO Box 131, Cheongryang, Seoul 130–650, Korea
Young-Jin Choi
Affiliation:
Materials Science and Technology Division, Korea Institute of Science and Technology, PO Box 131, Cheongryang, Seoul 130–650, Korea
Won-Jun Ko
Affiliation:
Materials Science and Technology Division, Korea Institute of Science and Technology, PO Box 131, Cheongryang, Seoul 130–650, Korea
In-Sung Whang
Affiliation:
Materials Science and Technology Division, Korea Institute of Science and Technology, PO Box 131, Cheongryang, Seoul 130–650, Korea
Jae-Gwan Park
Affiliation:
Materials Science and Technology Division, Korea Institute of Science and Technology, PO Box 131, Cheongryang, Seoul 130–650, Korea
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Abstract

ZnO nanorods were synthesized by a hot-wall type pulsed laser ablation process. At temperatures 500∼800°C, ZnO thin films and wrinkles were synthesized. Above 800°C, vertically aligned ZnO nanorods were grown on the Si and sapphire substrate without any catalysts. The range of diameter was 100∼300nm. When Au catalyst were deposited on the substrate prior to the deposition, the process range of ZnO nanorod become wider and the diameter of ZnO narrower. Especially, ZnO could be grown selectively along the pattern of Au catalyst with the aid of Au-Zn alloy.

Type
Research Article
Copyright
Copyright © Materials Research Society 2005

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References

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