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Zinc Diffusion Rates and Profiles in AlGaAs Alloys

Published online by Cambridge University Press:  26 February 2011

F. T. J. Smith
F. T. J. Smith*
Affiliation:
Eastman Kodak Company Corporate Research Laboratories, Rochester, NY 14650–2011
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Abstract

The diffusion rate of Zn in AlxGa1−xAs alloys has been determined, for values of x up to 1.0, as a function of temperature. At 625°C the diffusion coefficient shows a strong dependence on x, reaching a maximum at about 65% Al. A similar rapid increase in diffusion coefficient with x is seen at 700°C. The zinc concentration profiles are similar for all values of x, showing a very abrupt diffusion front. The activation energy for diffusion decreases with increasing x.

Type
Research Article
Information
MRS Online Proceedings Library (OPL) , Volume 240: Symposium E – Advanced III-V Compound Semiconductor Growth, Processing and Devices , 1991 , 727
Copyright
Copyright © Materials Research Society 1992

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References

REFERENCES

1. Matsumoto, Y., Japan J. Appl. Phys. 22, 829 (1983).Google Scholar
2. Yuan, Y. -R., Kazuo, E., Vawter, G. A., and Mertz, J. L., J. Appl. Phys. 54., 6044 (1983).Google Scholar
3. Ageno, S. K., Roedel, R. J., Mellen, N., and Escher, J. S., Appl. Phys. Lett. 17, 1193 (1985).Google Scholar
4. Quintana, V., Clemencon, J. J., and Chin, A. K., J. Appl. Phys. 63, 2454 (1988).CrossRefGoogle Scholar
5. Lee, C. P., Margalit, S., and Yariv, Y., Solid State Electron. 21, 905 (1978).Google Scholar
6. Casey, H. C. Jr, Panish, M. B., and Chang, L. L., Phys. Rev. 162, 660 (1967).Google Scholar
7. Smith, F. T. J. in “Proceedings of SOTAPOCS XIII” The Electrochemical Soc. Inc., Pennington NJ.Google Scholar
8. Lawrence, D. J., Smith, F. T. J., and Lee, S -T., J. Appl. Phys. 69, 3011 (1991).Google Scholar
9. Field, R. J. and Ghandhi, S., J. Electrochem. Soc. 129, 1567 (1982).Google Scholar
10. Weisberg, L. R. and Blanc, J., Phys. Rev. 131, 1548 (1963).Google Scholar